Inventor
NGUYEN ANH N
US26 patents
⚠️ This page may combine multiple inventors who share the name “NGUYEN ANH N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
20 patentsUS6660126B2Dec 9, 2003
Lid assembly for a processing system to facilitate sequential deposition techniques
APPLIED MATERIALS INC128 citations98
US6302964B1Oct 16, 2001
One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
APPLIED MATERIALS INC986 citations98
US6086677AJul 11, 2000
Dual gas faceplate for a showerhead in a semiconductor wafer processing system
APPLIED MATERIALS INC1,102 citations98
US6734020B2May 11, 2004
Valve control system for atomic layer deposition chamber
APPLIED MATERIALS INC135 citations97
US6364954B2Apr 2, 2002
High temperature chemical vapor deposition chamber
APPLIED MATERIALS INC342 citations97
US6494955B1Dec 17, 2002
Ceramic substrate support
APPLIED MATERIALS INC82 citations96
US6079356AJun 27, 2000
Reactor optimized for chemical vapor deposition of titanium
APPLIED MATERIALS INC766 citations96
US8382897B2Feb 26, 2013
Process gas delivery for semiconductor process chambers
APPLIED MATERIALS INC21 citations92
US7223323B2May 29, 2007
Multi-chemistry plating system
APPLIED MATERIALS INC44 citations92
US6299692B1Oct 9, 2001
Head for vaporizing and flowing various precursor materials onto semiconductor wafers during chemical vapor deposition
APPLIED MATERIALS INC29 citations92
US7201803B2Apr 10, 2007
Valve control system for atomic layer deposition chamber
APPLIED MATERIALS INC21 citations90
US7222636B2May 29, 2007
Electronically actuated valve
APPLIED MATERIALS INC25 citations89
US7520939B2Apr 21, 2009
Integrated bevel clean chamber
APPLIED MATERIALS INC12 citations84
US10577690B2Mar 3, 2020
Gas distribution showerhead for semiconductor processing
APPLIED MATERIALS INC2 citations73
US9768043B2Sep 19, 2017
Quartz upper and lower domes
APPLIED MATERIALS INC4 citations72
US10431435B2Oct 1, 2019
Wafer carrier with independent isolated heater zones
APPLIED MATERIALS INC3 citations69
US11322337B2May 3, 2022
Plasma processing system workpiece carrier with thermally isolated heater plate blocks
APPLIED MATERIALS INC1 citations62
US10829855B2Nov 10, 2020
Gas distribution showerhead for semiconductor processing
APPLIED MATERIALS INC0 citations52
US7947131B2May 24, 2011
Copper deposition chamber having integrated bevel clean with edge bevel removal detection
APPLIED MATERIALS INC1 citations52
US12575360B2Mar 10, 2026
Semiconductor processing chamber adapter
APPLIED MATERIALS INC0 citations51