P

Inventor

LEHR MATTHIAS

DE63 patents
⚠️ This page may combine multiple inventors who share the name “LEHR MATTHIAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

15 patents
US7550396B2Jun 23, 2009

Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device

ADVANCED MICRO DEVICES INC507 citations98
US7867917B2Jan 11, 2011

Etch stop layer for a metallization layer with enhanced adhesion, etch selectivity and hermeticity

ADVANCED MICRO DEVICES INC11 citations84
US7838359B2Nov 23, 2010

Technique for forming contact insulation layers and silicide regions with different characteristics

ADVANCED MICRO DEVICES INC10 citations84
US7491555B2Feb 17, 2009

Method and semiconductor structure for monitoring the fabrication of interconnect structures and contacts in a semiconductor device

ADVANCED MICRO DEVICES INC17 citations84
US7982313B2Jul 19, 2011

Semiconductor device including stress relaxation gaps for enhancing chip package interaction stability

ADVANCED MICRO DEVICES INC8 citations83
US7375032B2May 20, 2008

Semiconductor substrate thinning method for manufacturing thinned die

ADVANCED MICRO DEVICES INC11 citations82
US7592258B2Sep 22, 2009

Metallization layer of a semiconductor device having differently thick metal lines and a method of forming the same

ADVANCED MICRO DEVICES INC7 citations74
US7416992B2Aug 26, 2008

Method of patterning a low-k dielectric using a hard mask

ADVANCED MICRO DEVICES INC7 citations73
US7829889B2Nov 9, 2010

Method and semiconductor structure for monitoring etch characteristics during fabrication of vias of interconnect structures

ADVANCED MICRO DEVICES INC3 citations63
US7678699B2Mar 16, 2010

Method of forming an insulating capping layer for a copper metallization layer by using a silane reaction

ADVANCED MICRO DEVICES INC6 citations63
US7476626B2Jan 13, 2009

Etch stop layer for a metallization layer with enhanced etch selectivity and hermeticity

ADVANCED MICRO DEVICES INC2 citations63
US7306976B2Dec 11, 2007

Technique for enhancing thermal and mechanical characteristics of an underfill material of a substrate/die assembly

ADVANCED MICRO DEVICES INC5 citations63
US7569937B2Aug 4, 2009

Technique for forming a copper-based contact layer without a terminal metal

ADVANCED MICRO DEVICES INC3 citations62
US8039958B2Oct 18, 2011

Semiconductor device including a reduced stress configuration for metal pillars

ADVANCED MICRO DEVICES INC6 citations61
US7491638B2Feb 17, 2009

Method of forming an insulating capping layer for a copper metallization layer

ADVANCED MICRO DEVICES INC1 citations52

LEHR MATTHIAS

10 patents

GLOBALFOUNDRIES INC

8 patents

INFINEON TECHNOLOGIES AG

6 patents

SCHLARB UWE

3 patents

MERCKLE GMBH

2 patents

GEISLER HOLM

1 patent

GRILLBERGER MICHAEL

1 patent

BOEMMELS JUERGEN

1 patent

SAP SE

1 patent

WALTER AXEL

1 patent

VOITH PATENT GMBH

1 patent

Showing the top 50 of 63 patents by PatentIndex Score.