Inventor
LEHR MATTHIAS
DE63 patents
⚠️ This page may combine multiple inventors who share the name “LEHR MATTHIAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
15 patentsUS7550396B2Jun 23, 2009
Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device
ADVANCED MICRO DEVICES INC507 citations98
US7867917B2Jan 11, 2011
Etch stop layer for a metallization layer with enhanced adhesion, etch selectivity and hermeticity
ADVANCED MICRO DEVICES INC11 citations84
US7838359B2Nov 23, 2010
Technique for forming contact insulation layers and silicide regions with different characteristics
ADVANCED MICRO DEVICES INC10 citations84
US7491555B2Feb 17, 2009
Method and semiconductor structure for monitoring the fabrication of interconnect structures and contacts in a semiconductor device
ADVANCED MICRO DEVICES INC17 citations84
US7982313B2Jul 19, 2011
Semiconductor device including stress relaxation gaps for enhancing chip package interaction stability
ADVANCED MICRO DEVICES INC8 citations83
US7375032B2May 20, 2008
Semiconductor substrate thinning method for manufacturing thinned die
ADVANCED MICRO DEVICES INC11 citations82
US7592258B2Sep 22, 2009
Metallization layer of a semiconductor device having differently thick metal lines and a method of forming the same
ADVANCED MICRO DEVICES INC7 citations74
US7416992B2Aug 26, 2008
Method of patterning a low-k dielectric using a hard mask
ADVANCED MICRO DEVICES INC7 citations73
US7829889B2Nov 9, 2010
Method and semiconductor structure for monitoring etch characteristics during fabrication of vias of interconnect structures
ADVANCED MICRO DEVICES INC3 citations63
US7678699B2Mar 16, 2010
Method of forming an insulating capping layer for a copper metallization layer by using a silane reaction
ADVANCED MICRO DEVICES INC6 citations63
US7476626B2Jan 13, 2009
Etch stop layer for a metallization layer with enhanced etch selectivity and hermeticity
ADVANCED MICRO DEVICES INC2 citations63
US7306976B2Dec 11, 2007
Technique for enhancing thermal and mechanical characteristics of an underfill material of a substrate/die assembly
ADVANCED MICRO DEVICES INC5 citations63
US7569937B2Aug 4, 2009
Technique for forming a copper-based contact layer without a terminal metal
ADVANCED MICRO DEVICES INC3 citations62
US8039958B2Oct 18, 2011
Semiconductor device including a reduced stress configuration for metal pillars
ADVANCED MICRO DEVICES INC6 citations61
US7491638B2Feb 17, 2009
Method of forming an insulating capping layer for a copper metallization layer
ADVANCED MICRO DEVICES INC1 citations52
LEHR MATTHIAS
10 patentsUS8924565B2Dec 30, 2014
Transport of customer flexibility changes in a multi-tenant environment
LEHR MATTHIAS60 citations97
US8392573B2Mar 5, 2013
Transport of customer flexibility changes in a multi-tenant environment
LEHR MATTHIAS72 citations97
US8863005B2Oct 14, 2014
Propagating business object extension fields from source to target
LEHR MATTHIAS16 citations82
US8329577B2Dec 11, 2012
Method of forming an alloy in an interconnect structure to increase electromigration resistance
LEHR MATTHIAS8 citations82
US9054112B2Jun 9, 2015
Semiconductor device comprising a die seal having an integrated alignment mark
LEHR MATTHIAS5 citations73
US8283247B2Oct 9, 2012
Semiconductor device including a die region designed for aluminum-free solder bump connection and a test structure designed for aluminum-free wire bonding
LEHR MATTHIAS4 citations57
US9450042B2Sep 20, 2016
Integrated circuits with metal-insulator-metal (MIM) capacitors and methods for fabricating same
LEHR MATTHIAS0 citations52
US8561446B2Oct 22, 2013
Method and device for fabricating bonding wires on the basis of microelectronic manufacturing techniques
LEHR MATTHIAS0 citations52
US8216880B2Jul 10, 2012
Wire bonding on reactive metal surfaces of a metallization of a semiconductor device by providing a protection layer
LEHR MATTHIAS0 citations52
US8114688B2Feb 14, 2012
Method and semiconductor structure for monitoring etch characteristics during fabrication of vias of interconnect structures
LEHR MATTHIAS1 citations52
GLOBALFOUNDRIES INC
8 patentsUS8053354B2Nov 8, 2011
Reduced wafer warpage in semiconductors by stress engineering in the metallization system
GLOBALFOUNDRIES INC7 citations84
US8043956B2Oct 25, 2011
Wire bonding on reactive metal surfaces of a metallization of a semiconductor device by providing a protective layer
GLOBALFOUNDRIES INC8 citations84
US7713815B2May 11, 2010
Semiconductor device including a vertical decoupling capacitor
GLOBALFOUNDRIES INC5 citations63
US7829357B2Nov 9, 2010
Method and test structure for monitoring CMP processes in metallization layers of semiconductor devices
GLOBALFOUNDRIES INC2 citations62
US9136234B2Sep 15, 2015
Semiconductor device with improved metal pillar configuration
GLOBALFOUNDRIES INC3 citations61
US10607947B2Mar 31, 2020
Semiconductor device comprising a die seal including long via lines
GLOBALFOUNDRIES INC0 citations51
US10014234B2Jul 3, 2018
Semiconductor device comprising a die seal including long via lines
GLOBALFOUNDRIES INC0 citations51
US8039400B2Oct 18, 2011
Reducing contamination of semiconductor substrates during BEOL processing by performing a deposition/etch cycle during barrier deposition
GLOBALFOUNDRIES INC1 citations51
INFINEON TECHNOLOGIES AG
6 patentsUS6458631B1Oct 1, 2002
Method for fabricating an integrated circuit, in particular an antifuse
INFINEON TECHNOLOGIES AG17 citations83
US6635567B2Oct 21, 2003
Method of producing alignment marks
INFINEON TECHNOLOGIES AG19 citations74
US6716678B2Apr 6, 2004
Method for producing an antifuse and antifuse for the selective electrical connection of adjacent conductive regions
INFINEON TECHNOLOGIES AG4 citations60
US6387792B2May 14, 2002
Method of fabricating a dielectric antifuse structure
INFINEON TECHNOLOGIES AG5 citations60
US6455435B1Sep 24, 2002
Method for fabricating a wiring plane on a semiconductor chip with an antifuse
INFINEON TECHNOLOGIES AG3 citations59
US6337263B1Jan 8, 2002
Method for improving the quality of metal conductor tracks on semiconductor structures
INFINEON TECHNOLOGIES AG0 citations52
SCHLARB UWE
3 patentsUS8489640B2Jul 16, 2013
Field extensibility using generic boxed components
SCHLARB UWE24 citations89
US9244697B2Jan 26, 2016
Stable anchors in user interface to support life cycle extensions
SCHLARB UWE16 citations81
US8819075B2Aug 26, 2014
Facilitation of extension field usage based on reference field usage
SCHLARB UWE15 citations81
MERCKLE GMBH
2 patentsUS6310217B1Oct 30, 2001
Acylpyrroledicarboxylic acids and acylindoledicarboxylic acids and their derivatives as inhibitors of cytosolic phospholipase A2
MERCKLE GMBH28 citations93
US5260451ANov 9, 1993
Substituted pyrrole compounds and use thereof in pharmaceutical compositions
MERCKLE GMBH24 citations88
GEISLER HOLM
1 patentGRILLBERGER MICHAEL
1 patentBOEMMELS JUERGEN
1 patentSAP SE
1 patentWALTER AXEL
1 patentVOITH PATENT GMBH
1 patentShowing the top 50 of 63 patents by PatentIndex Score.