Inventor

CHO YONG-JHIN

KR21 patents

⚠️ This page may combine multiple inventors who share the name “CHO YONG-JHIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHO YONG-JHIN

SAMSUNG ELECTRONICS CO LTD

Apparatus and methods for treating a substrate

Process chamber and substrate processing apparatus including the same

Substrate processing apparatus and apparatus for manufacturing integrated circuit device

Manufacturing method and fluid supply system for treating substrate

Substrate treating apparatus

Manufacturing method and fluid supply system for treating substrate

Substrate drying apparatus, facility of manufacturing semiconductor device, and method of drying substrate

Apparatus and methods for treating a substrate

Substrate processing apparatus and apparatus for manufacturing integrated circuit device

Process chamber and substrate processing apparatus including the same

Apparatus for removing a photoresist and apparatus for manufacturing a comiconductor device

Apparatus for removing a photoresist and apparatus for manufacturing a semiconductor device

Apparatus for fabricating semiconductor device having upper and lower inlets for supplying supercritical fluids and method of fabricating semiconductor device using the same

Cleaning solution composition and method of cleaning semiconductor device using the same

Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying system

Method and apparatus for purifying cleaning agent

Process chamber for a supercritical process and apparatus for treating substrates having the same

Chemical liquid supply apparatus and semiconductor processing apparatus having the same

CHO YONG-JHIN

Substrate treatment systems using supercritical fluid

Substrate processing method and substrate processing system for performing the same

JUN YONG MYUNG

Sealing member and substrate processing apparatus including the same