Inventor

SAKAIDA YASUSHI

JP25 patents

⚠️ This page may combine multiple inventors who share the name “SAKAIDA YASUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAKAIDA YASUSHI

NISSAN CHEMICAL IND LTD

Underlayer coating forming composition for lithography containing compound having protected carboxyl group

Composition for forming nitride coating film for hard mask

Resist underlayer film-forming composition and method for forming resist pattern using the same

Acrylic polymer-containing gap fill material forming composition for lithography

Method for manufacturing semiconductor device using quadruple-layer laminate

Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating

Coating liquid to be applied to resist pattern and method for forming reverse pattern

Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer

Additive and resist underlayer film-forming composition containing the same

Polymer-containing coating liquid applied to resist pattern

Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound

NISSAN CHEMICAL CORP

Protective film-forming composition

Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method

Composition for forming resist underlayer film

Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive

HOYA CORP

Mask blank and transfer mask

Mask blank, method for manufacturing mask blank and transfer mask

TAKEI SATOSHI

Underlying coating forming composition for lithography containing compound having protected carboxyl group

Underlayer coating forming composition containing dextrin ester compound

MARUYAMA DAISUKE

Pattern reversal film forming composition and method of forming reversed pattern

SAKAIDA YASUSHI

Composition for forming pattern reversal film and method for forming reversal pattern

NAKAJIMA MAKOTO

Thin film forming composition for lithography containing titanium and silicon

SHINJO TETSUYA

Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring

IMAMURA HIKARU

Composition for forming resist underlayer film for lithography and production method of semiconductor device

SAKAMOTO RIKIMARU

Polymer-containing developer