Inventor
TANASA GHEORGHE
NL16 patents
⚠️ This page may combine multiple inventors who share the name “TANASA GHEORGHE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
11 patentsUS10216100B2Feb 26, 2019
Inspection substrate and an inspection method
ASML NETHERLANDS BV2 citations69
US9709901B2Jul 18, 2017
Lithographic apparatus and a method of operating the apparatus
ASML NETHERLANDS BV1 citations61
US11860546B2Jan 2, 2024
Fluid handling structure for lithographic apparatus
ASML NETHERLANDS BV0 citations59
US11454892B2Sep 27, 2022
Fluid handling structure for lithographic apparatus
ASML NETHERLANDS BV0 citations59
US11029607B2Jun 8, 2021
Fluid handling structure for lithographic apparatus
ASML NETHERLANDS BV0 citations59
US11086239B2Aug 10, 2021
Cleaning device and method of cleaning
ASML NETHERLANDS BV0 citations55
US10429741B2Oct 1, 2019
Lithographic apparatus and a method of operating the apparatus
ASML NETHERLANDS BV0 citations50
US10151984B2Dec 11, 2018
Lithographic apparatus and a method of operating the apparatus
ASML NETHERLANDS BV0 citations50
US10146139B2Dec 4, 2018
Lithographic apparatus and a method of operating the apparatus
ASML NETHERLANDS BV0 citations50
US10725390B2Jul 28, 2020
Inspection substrate and an inspection method
ASML NETHERLANDS BV0 citations48
US10175585B2Jan 8, 2019
Lithographic apparatus and a method of operating the apparatus
ASML NETHERLANDS BV0 citations48
BRUIJSTENS JEROEN PETER JOHANNES
2 patentsUS8730447B2May 20, 2014
Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure
BRUIJSTENS JEROEN PETER JOHANNES3 citations59
US9176371B2Nov 3, 2015
Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
BRUIJSTENS JEROEN PETER JOHANNES2 citations58