P

Inventor

TUNG SZU-PING

TW37 patents
⚠️ This page may combine multiple inventors who share the name “TUNG SZU-PING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

32 patents
US11682624B2Jun 20, 2023

Method of forming an interconnect structure having an air gap and structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations86
US10685873B2Jun 16, 2020

Etch stop layer for semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10468297B1Nov 5, 2019

Metal-based etch-stop layer

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9576892B2Feb 21, 2017

Semiconductor devices and methods of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9496169B2Nov 15, 2016

Method of forming an interconnect structure having an air gap and structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10535816B2Jan 14, 2020

Via structure, MRAM device using the via structure and method for fabricating the MRAM device

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US11651993B2May 16, 2023

Etch stop layer for semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11322396B2May 3, 2022

Etch stop layer for semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11004734B2May 11, 2021

Metal-based etch-stop layer

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10103099B2Oct 16, 2018

Semiconductor devices and methods of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9917058B2Mar 13, 2018

Method of forming an interconnect structure having an air gap and structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9640428B2May 2, 2017

Self-aligned repairing process for barrier layer

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9589800B2Mar 7, 2017

Method for integrated circuit patterning

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9514928B2Dec 6, 2016

Selective repairing process for barrier layer

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11715640B2Aug 1, 2023

Patterning material including silicon-containing layer and method for semiconductor device fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11515474B2Nov 29, 2022

Memory device and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10862026B2Dec 8, 2020

Memory device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11804410B2Oct 31, 2023

Thin-film non-uniform stress evaluation

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations69
US12451393B2Oct 21, 2025

Etch stop layer for semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12205824B2Jan 21, 2025

Patterning material including silicon-containing layer and method for semiconductor device fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12159838B2Dec 3, 2024

Method of forming an interconnect structure having an air gap and structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11991930B2May 21, 2024

Memory device and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11769693B2Sep 26, 2023

Metal-based etch-stop layer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11004793B2May 11, 2021

Method of forming an interconnect structure having an air gap and structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10867794B2Dec 15, 2020

Patterning method for semiconductor devices and structures resulting therefrom

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12057445B2Aug 6, 2024

Method of manufacturing a semiconductor device and a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12374588B2Jul 29, 2025

Method for evaluating non-uniform stress

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10340223B2Jul 2, 2019

Method of forming an interconnect structure having an air gap and structure thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9873944B2Jan 23, 2018

Metal capping process and processing platform thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9543198B2Jan 10, 2017

Structure and method for forming interconnect structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9487864B2Nov 8, 2016

Metal capping process and processing platform thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12400875B2Aug 26, 2025

Film deposition for patterning process

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations45

TAIWAN SEMICONDUCTOR MFG

5 patents