Inventor
TUNG SZU-PING
TW37 patents
⚠️ This page may combine multiple inventors who share the name “TUNG SZU-PING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
32 patentsUS11682624B2Jun 20, 2023
Method of forming an interconnect structure having an air gap and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations86
US10685873B2Jun 16, 2020
Etch stop layer for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10468297B1Nov 5, 2019
Metal-based etch-stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9576892B2Feb 21, 2017
Semiconductor devices and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9496169B2Nov 15, 2016
Method of forming an interconnect structure having an air gap and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10535816B2Jan 14, 2020
Via structure, MRAM device using the via structure and method for fabricating the MRAM device
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US11651993B2May 16, 2023
Etch stop layer for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11322396B2May 3, 2022
Etch stop layer for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11004734B2May 11, 2021
Metal-based etch-stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10103099B2Oct 16, 2018
Semiconductor devices and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9917058B2Mar 13, 2018
Method of forming an interconnect structure having an air gap and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9640428B2May 2, 2017
Self-aligned repairing process for barrier layer
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9589800B2Mar 7, 2017
Method for integrated circuit patterning
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9514928B2Dec 6, 2016
Selective repairing process for barrier layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11715640B2Aug 1, 2023
Patterning material including silicon-containing layer and method for semiconductor device fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11515474B2Nov 29, 2022
Memory device and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10862026B2Dec 8, 2020
Memory device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11804410B2Oct 31, 2023
Thin-film non-uniform stress evaluation
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations69
US12451393B2Oct 21, 2025
Etch stop layer for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12205824B2Jan 21, 2025
Patterning material including silicon-containing layer and method for semiconductor device fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12159838B2Dec 3, 2024
Method of forming an interconnect structure having an air gap and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11991930B2May 21, 2024
Memory device and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11769693B2Sep 26, 2023
Metal-based etch-stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11004793B2May 11, 2021
Method of forming an interconnect structure having an air gap and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10867794B2Dec 15, 2020
Patterning method for semiconductor devices and structures resulting therefrom
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12057445B2Aug 6, 2024
Method of manufacturing a semiconductor device and a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12374588B2Jul 29, 2025
Method for evaluating non-uniform stress
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10340223B2Jul 2, 2019
Method of forming an interconnect structure having an air gap and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9873944B2Jan 23, 2018
Metal capping process and processing platform thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9543198B2Jan 10, 2017
Structure and method for forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9487864B2Nov 8, 2016
Metal capping process and processing platform thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12400875B2Aug 26, 2025
Film deposition for patterning process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations45
TAIWAN SEMICONDUCTOR MFG
5 patentsUS8940635B1Jan 27, 2015
Structure and method for forming interconnect structure
TAIWAN SEMICONDUCTOR MFG21 citations92
US9129814B2Sep 8, 2015
Method for integrated circuit patterning
TAIWAN SEMICONDUCTOR MFG2 citations63
US9324606B2Apr 26, 2016
Self-aligned repairing process for barrier layer
TAIWAN SEMICONDUCTOR MFG0 citations52
US9218986B2Dec 22, 2015
Hard mask edge cover scheme
TAIWAN SEMICONDUCTOR MFG0 citations52
US8980745B1Mar 17, 2015
Interconnect structures and methods of forming same
TAIWAN SEMICONDUCTOR MFG1 citations51