Inventor
KIRCHNER ANDREAS
DE21 patents
⚠️ This page may combine multiple inventors who share the name “KIRCHNER ANDREAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GEN ELECTRIC
6 patentsUS7908036B2Mar 15, 2011
Power production control system and method
GEN ELECTRIC19 citations92
US7613548B2Nov 3, 2009
Systems and methods for controlling a ramp rate of a wind farm
GEN ELECTRIC46 citations90
US7573160B2Aug 11, 2009
Methods and apparatus for controlling windfarms and windfarms controlled thereby
GEN ELECTRIC15 citations80
US7890217B2Feb 15, 2011
Integrated real-time power and solar farm control system
GEN ELECTRIC17 citations79
US7720639B2May 18, 2010
Automatic remote monitoring and diagnostics system and communication method for communicating between a programmable logic controller and a central unit
GEN ELECTRIC11 citations77
US8018082B2Sep 13, 2011
Method and apparatus for controlling a wind turbine
GEN ELECTRIC6 citations62
KIRCHNER ANDREAS
6 patentsUS9046077B2Jun 2, 2015
Reactive power controller for controlling reactive power in a wind farm
KIRCHNER ANDREAS31 citations89
US8610306B2Dec 17, 2013
Power plant control system and method for influencing high voltage characteristics
KIRCHNER ANDREAS8 citations83
US8258746B2Sep 4, 2012
Charger and charging method
KIRCHNER ANDREAS12 citations83
US8185249B2May 22, 2012
Wind farm power production control system
KIRCHNER ANDREAS10 citations83
US8744635B2Jun 3, 2014
Power production control method based on power production rate requirement
KIRCHNER ANDREAS1 citations62
US8175755B2May 8, 2012
Systems and methods for monitoring power devices
KIRCHNER ANDREAS2 citations62
ZEISS CARL SMT AG
3 patentsUS7372539B2May 13, 2008
Method for distortion correction in a microlithographic projection exposure apparatus
ZEISS CARL SMT AG10 citations83
US7605905B2Oct 20, 2009
Method for distortion correction in a microlithographic projection exposure apparatus
ZEISS CARL SMT AG2 citations62
US7522260B1Apr 21, 2009
Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components
ZEISS CARL SMT AG5 citations62