Inventor

MANN HANS-JUERGEN

DE136 patents

⚠️ This page may combine multiple inventors who share the name “MANN HANS-JUERGEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MANN HANS-JUERGEN

ZEISS CARL SMT AG

Catoptric objectives and systems using catoptric objectives

Projection objectives including a plurality of mirrors with lenses ahead of mirror M3

Objective with pupil obscuration

8-mirror microlithography projection objective

Reflective projection lens for EUV-photolithography

Catadioptric projection objective

Projection system for EUV lithography

Projection system for EUV lithography

Illumination system particularly for microlithography

Projection system for EUV lithography

Projection system for EUV lithography

Reflective projection lens for EUV-photolithography

8-mirror microlithography projection objective

6-mirror microlithography projection objective

Reflective X-ray microscope and inspection system for examining objects with wavelengths &lt;100 nm

Projection exposure apparatus

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

Imaging system with mirror group

Illumination system particularly for microlithography

Projection exposure apparatus and projection optical system

Method for distortion correction in a microlithographic projection exposure apparatus

Catadioptric projection objective

Illumination system particularly for microlithography

8-mirror microlithography projection objective

ZEISS CARL SMT GMBH

Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methods

Imaging optical system

Catoptric objectives and systems using catoptric objectives

Projection objective

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

Illumination system particularly for microlithography

Projection optics for microlithography

Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methods

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

Catadioptric projection objective with parallel, offset optical axes

Reflective optical element and EUV lithography appliance

MANN HANS-JUERGEN

Illumination optical system for projection lithography

Imaging optical system

Catoptric objectives and systems using catoptric objectives

Catoptric objectives and systems using catoptric objectives

Imaging optical system

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

Microlithographic imaging optical system including multiple mirrors

SHAFER DAVID

Catadioptric projection objective

Catadioptric projection objective

CHAN DANNY

Projection objectives having mirror elements with reflective coatings

Projection objective having mirror elements with reflective coatings

CARL ZEISS SEMICONDUCTOR

Illumination system particularly for microlithography

ZEISS STIFTUNG

Reduction objective for extreme ultraviolet lithography

ZELLNER JOHANNES

Projection objective for microlithography

TRENKLER JOHANN

Reflective optical element and EUV lithography appliance

Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm