Inventor
HORIGUCHI MASATO
JP22 patents
⚠️ This page may combine multiple inventors who share the name “HORIGUCHI MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
5 patentsUS10910251B2Feb 2, 2021
Pin control method and substrate processing apparatus
TOKYO ELECTRON LTD3 citations72
US10438834B2Oct 8, 2019
Pin control method
TOKYO ELECTRON LTD3 citations72
US9685305B2Jun 20, 2017
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD4 citations68
US7618515B2Nov 17, 2009
Focus ring, plasma etching apparatus and plasma etching method
TOKYO ELECTRON LTD1 citations51
US10347499B2Jul 9, 2019
Method for etching layer to be etched
TOKYO ELECTRON LTD0 citations42
SONY CORP
4 patentsUS7461161B2Dec 2, 2008
Information processing apparatus and method for decoding encoded data
SONY CORP30 citations92
US6883043B2Apr 19, 2005
Information processing apparatus incorporated in a control unit storing an authentication information and transmitting a command to request an access right when a first mode is set
SONY CORP9 citations73
US10320759B2Jun 11, 2019
Streaming system and method
SONY CORP0 citations52
US9088548B2Jul 21, 2015
Streaming system and method
SONY CORP0 citations52
GKN AUTOMOTIVE LTD
4 patentsUS11885399B2Jan 30, 2024
Power transmission device
GKN AUTOMOTIVE LTD2 citations72
US11879533B2Jan 23, 2024
Differential device
GKN AUTOMOTIVE LTD2 citations71
US11402006B2Aug 2, 2022
Differential device
GKN AUTOMOTIVE LTD3 citations71
US11940015B2Mar 26, 2024
Power transmission device
GKN AUTOMOTIVE LTD0 citations61
SAMSUNG ELECTRONICS CO LTD
3 patentsUS11348760B2May 31, 2022
Plasma processing apparatus and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD2 citations70
US12437969B2Oct 7, 2025
Plasma processing equipment
SAMSUNG ELECTRONICS CO LTD0 citations58
US11501953B2Nov 15, 2022
Plasma processing equipment
SAMSUNG ELECTRONICS CO LTD0 citations58