P

Inventor

KOSHIISHI AKIRA

JP65 patents
⚠️ This page may combine multiple inventors who share the name “KOSHIISHI AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

38 patents
US7951262B2May 31, 2011

Plasma processing apparatus and method

TOKYO ELECTRON LTD486 citations99
US5900103AMay 4, 1999

Plasma treatment method and apparatus

TOKYO ELECTRON LTD173 citations99
US6544380B2Apr 8, 2003

Plasma treatment method and apparatus

TOKYO ELECTRON LTD104 citations98
US6074518AJun 13, 2000

Plasma processing apparatus

TOKYO ELECTRON LTD276 citations98
US6072147AJun 6, 2000

Plasma processing system

TOKYO ELECTRON LTD261 citations98
US5919332AJul 6, 1999

Plasma processing apparatus

TOKYO ELECTRON LTD445 citations98
US7988816B2Aug 2, 2011

Plasma processing apparatus and method

TOKYO ELECTRON LTD63 citations97
US6733624B2May 11, 2004

Apparatus for holding an object to be processed

TOKYO ELECTRON LTD66 citations96
US6423242B1Jul 23, 2002

Etching method

TOKYO ELECTRON LTD58 citations96
US6106737AAug 22, 2000

Plasma treatment method utilizing an amplitude-modulated high frequency power

TOKYO ELECTRON LTD66 citations96
US5928963AJul 27, 1999

Plasma etching method

TOKYO ELECTRON LTD62 citations96
US5083061AJan 21, 1992

Electron beam excited ion source

TOKYO ELECTRON LTD67 citations96
US6190495B1Feb 20, 2001

Magnetron plasma processing apparatus

TOKYO ELECTRON LTD81 citations95
US7988814B2Aug 2, 2011

Plasma processing apparatus, plasma processing method, focus ring, and focus ring component

TOKYO ELECTRON LTD23 citations93
US7882800B2Feb 8, 2011

Ring mechanism, and plasma processing device using the ring mechanism

TOKYO ELECTRON LTD31 citations92
US7740737B2Jun 22, 2010

Plasma processing apparatus and method

TOKYO ELECTRON LTD25 citations92
US7537672B1May 26, 2009

Apparatus for plasma processing

TOKYO ELECTRON LTD44 citations92
US6576860B2Jun 10, 2003

Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate

TOKYO ELECTRON LTD28 citations92
US6426477B1Jul 30, 2002

Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate

TOKYO ELECTRON LTD32 citations92
US5252892AOct 12, 1993

Plasma processing apparatus

TOKYO ELECTRON LTD30 citations92
US5101110AMar 31, 1992

Ion generator

TOKYO ELECTRON LTD33 citations92
US5089747AFeb 18, 1992

Electron beam excitation ion source

TOKYO ELECTRON LTD22 citations92
US5028791AJul 2, 1991

Electron beam excitation ion source

TOKYO ELECTRON LTD44 citations92
US7658816B2Feb 9, 2010

Focus ring and plasma processing apparatus

TOKYO ELECTRON LTD36 citations91
US6764575B1Jul 20, 2004

Magnetron plasma processing apparatus

TOKYO ELECTRON LTD36 citations91
US9490105B2Nov 8, 2016

Plasma processing apparatus and method

TOKYO ELECTRON LTD6 citations84
US8008596B2Aug 30, 2011

Plasma processing apparatus and electrode used therein

TOKYO ELECTRON LTD10 citations84
US7993489B2Aug 9, 2011

Capacitive coupling plasma processing apparatus and method for using the same

TOKYO ELECTRON LTD9 citations84
US7506610B2Mar 24, 2009

Plasma processing apparatus and method

TOKYO ELECTRON LTD15 citations84
US7494561B2Feb 24, 2009

Plasma processing apparatus and method, and electrode plate for plasma processing apparatus

TOKYO ELECTRON LTD12 citations84
US10229815B2Mar 12, 2019

Plasma etching apparatus and method

TOKYO ELECTRON LTD6 citations83
US7449414B2Nov 11, 2008

Method of treating a mask layer prior to performing an etching process

TOKYO ELECTRON LTD7 citations74
US10854431B2Dec 1, 2020

Plasma processing apparatus and method

TOKYO ELECTRON LTD2 citations73
US10546727B2Jan 28, 2020

Plasma processing apparatus and method

TOKYO ELECTRON LTD2 citations73
US10529596B2Jan 7, 2020

Capacitive coupling plasma processing apparatus and method for using the same

TOKYO ELECTRON LTD1 citations73
US10861678B2Dec 8, 2020

Plasma etching apparatus and method

TOKYO ELECTRON LTD4 citations72
US5972799AOct 26, 1999

Dry etching method

TOKYO ELECTRON LTD8 citations72
US5698035ADec 16, 1997

Heat-resistant electrode material, electrode using the same, and apparatus having plasma generating unit using this electrode

TOKYO ELECTRON LTD12 citations71

KOSHIISHI AKIRA

5 patents
US8603293B2Dec 10, 2013

Plasma processing apparatus and method

KOSHIISHI AKIRA73 citations97
US8741098B2Jun 3, 2014

Table for use in plasma processing system and plasma processing system

KOSHIISHI AKIRA11 citations84
US8137471B2Mar 20, 2012

Plasma processing apparatus and method

KOSHIISHI AKIRA12 citations84
US8852385B2Oct 7, 2014

Plasma etching apparatus and method

KOSHIISHI AKIRA12 citations83
US8084375B2Dec 27, 2011

Hot edge ring with sloped upper surface

KOSHIISHI AKIRA13 citations79

HOLLAND JOHN PATRICK

2 patents
US9177756B2Nov 3, 2015

E-beam enhanced decoupled source for semiconductor processing

HOLLAND JOHN PATRICK23 citations92
US9111728B2Aug 18, 2015

E-beam enhanced decoupled source for semiconductor processing

HOLLAND JOHN PATRICK8 citations83

LAM RES CORP

2 patents
US10720314B2Jul 21, 2020

Confinement ring for use in a plasma processing system

LAM RES CORP5 citations83
US11342166B2May 24, 2022

Confinement ring for use in a plasma processing system

LAM RES CORP2 citations72

SAMSUNG ELECTRONICS CO LTD

2 patents
US11195696B2Dec 7, 2021

Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same

SAMSUNG ELECTRONICS CO LTD4 citations71
US11348760B2May 31, 2022

Plasma processing apparatus and method of manufacturing semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD2 citations70

FISCHER ANDREAS

1 patent
US8627783B2Jan 14, 2014

Combined wafer area pressure control and plasma confinement assembly

FISCHER ANDREAS4 citations73

Showing the top 50 of 65 patents by PatentIndex Score.