Inventor
CHIEN RONG-WU
TW13 patents
Patents
13 patentsUS5895740AApr 20, 1999
Method of forming contact holes of reduced dimensions by using in-situ formed polymeric sidewall spacers
VANGUARD INT SEMICONDUCT CORP176 citations98
US5904154AMay 18, 1999
Method for removing fluorinated photoresist layers from semiconductor substrates
VANGUARD INT SEMICONDUCT CORP82 citations93
US6168987B1Jan 2, 2001
Method for fabricating crown-shaped capacitor structures
VANGUARD INT SEMICONDUCT CORP27 citations92
US5869383AFeb 9, 1999
High contrast, low noise alignment mark for laser trimming of redundant memory arrays
VANGUARD INT SEMICONDUCT CORP43 citations92
US5686337ANov 11, 1997
Method for fabricating stacked capacitors in a DRAM cell
VANGUARD INT SEMICONDUCT CORP54 citations92
US5643824AJul 1, 1997
Method of forming nitride sidewalls having spacer feet in a locos process
VANGUARD INT SEMICONDUCT CORP20 citations91
US6010942AJan 4, 2000
Post chemical mechanical polishing, clean procedure, used for fabrication of a crown shaped capacitor structure
VANGUARD INT SEMICONDUCT CORP40 citations88
US5702869ADec 30, 1997
Soft ashing method for removing fluorinated photoresists layers from semiconductor substrates
VANGUARD INT SEMICONDUCT CORP30 citations86
US6136688AOct 24, 2000
High stress oxide to eliminate BPSG/SiN cracking
VANGUARD INT SEMICONDUCT CORP16 citations81
US6307273B1Oct 23, 2001
High contrast, low noise alignment mark for laser trimming of redundant memory arrays
VANGUARD INT SEMICONDUCT CORP11 citations73
US5597764AJan 28, 1997
Method of contact formation and planarization for semiconductor processes
VANGUARD INT SEMICONDUCT CORP11 citations73
US6043160AMar 28, 2000
Method of manufacturing a monitor pad for chemical mechanical polishing planarization
VANGUARD INT SEMICONDUCT CORP0 citations51
US6204195B1Mar 20, 2001
Method to prevent CMP overpolish
VANGUARD INT SEMICONDUCT CORP0 citations45