Inventor

TOPRAC ANTHONY J

US59 patents

⚠️ This page may combine multiple inventors who share the name “TOPRAC ANTHONY J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOPRAC ANTHONY J

ADVANCED MICRO DEVICES INC

Method and apparatus for controlling deposition process using residual gas analysis

Method for identifying and controlling impact of ambient conditions on photolithography processes

Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication

Method and apparatus for dynamic sampling of a production line

Method and apparatus for run-to-run controlling of overlay registration

Process control with control signal derived from metrology of a repetitive critical dimension feature of a test structure on the work piece

Method and apparatus for characterizing semiconductor device performance variations based on independent critical dimension measurements

Method and apparatus for automatic routing for reentrant processes

Method and apparatus for automatic routing for reentrant process

Method and apparatus for control of critical dimension using feedback etch control

Method and apparatus for incorporating control simulation environment

Method and apparatus for using scatterometry to perform feedback and feed-forward control

Method and apparatus for monitoring controller performance using statistical process control

Incorporation of critical dimension measurements as disturbances to lithography overlay run to run controller

Method and apparatus for optimal wafer-by-wafer processing

Method and apparatus for modeling thickness profiles and controlling subsequent etch process

Method and apparatus for monitoring material removal tool performance using endpoint time removal rate determination

Isotropically etching sidewall spacers to be used for both an NMOS source/drain implant and a PMOS LDD implant

Method and apparatus for programmed latency for improving wafer-to-wafer uniformity

Method for controlling transistor spacer width

Method and apparatus for using a dynamic control model to compensate for a process interrupt

Method and apparatus for controlling wafer uniformity using spatially resolved sensors

Method and apparatus for control for semiconductor processing for reducing effects of environmental effects

Method and apparatus for automatic calibration of critical dimension metrology tool

Method for identifying and controlling impact of ambient conditions on photolithography processes

Method and apparatus for data stackification for run-to-run control

Isotropically etching sidewall spacers to be used for both an NMOS source/drain implant and a PMOS LDD implant

Method and apparatus for initializing tool controllers based on tool event data

Method and apparatus for adaptively scheduling tool maintenance

Method for prioritizing production lots based on grade estimates and output requirements

Method and apparatus for controlling a tool using a baseline control script

Method and apparatus for performing run-to-run control in a batch manufacturing environment

Method for controlling deposition parameters based on polysilicon grain size feedback

Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same

Method of controlling chemical mechanical polishing operations to control erosion of insulating materials

System for controlling transistor spacer width

Method and apparatus for controlling process target values based on manufacturing metrics

Method and apparatus for integrating multiple process controllers

Method and apparatus for run-to-run controlling of overlay registration

Method and apparatus for controlling the flow of wafers through a process flow

Method and apparatus for data stackification for run-to-run control

Method of controlling the duration of an endpoint polishing process in a multistage polishing process

Method of forming semiconductor devices using gate electrode dimensions and dopant concentration for controlling drive current strength

Method and apparatus for updating control state variables of a process control model based on rework data

Method and apparatus for distinguishing between sources of process variation

Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same

Method and apparatus for control of multi-cup semiconductor manufacturing tracks

(unassigned)

Method and apparatus for post-polish thickness and uniformity control

ADAVANCED MICRO DEVICES INC

Method for relating photolithography overlay target damage and chemical mechanical planarization (CMP) fault detection to CMP tool indentification

YIELD DYNAMICS INC

Method for chemical-mechanical polish control in semiconductor manufacturing