Inventor
CAMPBELL WILLIAM JARRETT
US19 patents
⚠️ This page may combine multiple inventors who share the name “CAMPBELL WILLIAM JARRETT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
17 patentsUS6197604B1Mar 6, 2001
Method for providing cooperative run-to-run control for multi-product and multi-process semiconductor fabrication
ADVANCED MICRO DEVICES INC119 citations98
US6529789B1Mar 4, 2003
Method and apparatus for automatic routing for reentrant processes
ADVANCED MICRO DEVICES INC95 citations97
US6360133B1Mar 19, 2002
Method and apparatus for automatic routing for reentrant process
ADVANCED MICRO DEVICES INC82 citations97
US6230069B1May 8, 2001
System and method for controlling the manufacture of discrete parts in semiconductor fabrication using model predictive control
ADVANCED MICRO DEVICES INC162 citations97
US6484064B1Nov 19, 2002
Method and apparatus for running metrology standard wafer routes for cross-fab metrology calibration
ADVANCED MICRO DEVICES INC64 citations96
US6217412B1Apr 17, 2001
Method for characterizing polish pad lots to eliminate or reduce tool requalification after changing a polishing pad
ADVANCED MICRO DEVICES INC71 citations96
US6213848B1Apr 10, 2001
Method for determining a polishing recipe based upon the measured pre-polish thickness of a process layer
ADVANCED MICRO DEVICES INC44 citations96
US6350179B2Feb 26, 2002
Method for determining a polishing recipe based upon the measured pre-polish thickness of a process layer
ADVANCED MICRO DEVICES INC31 citations92
US6546306B1Apr 8, 2003
Method for adjusting incoming film thickness uniformity such that variations across the film after polishing minimized
ADVANCED MICRO DEVICES INC25 citations91
US6171174B1Jan 9, 2001
System and method for controlling a multi-arm polishing tool
ADVANCED MICRO DEVICES INC25 citations88
US6650957B1Nov 18, 2003
Method and apparatus for run-to-run control of deposition process
ADVANCED MICRO DEVICES INC19 citations84
US6376261B1Apr 23, 2002
Method for varying nitride strip makeup process based on field oxide loss and defect count
ADVANCED MICRO DEVICES INC18 citations84
US6856849B2Feb 15, 2005
Method for adjusting rapid thermal processing (RTP) recipe setpoints based on wafer electrical test (WET) parameters
ADVANCED MICRO DEVICES INC6 citations73
US6850322B2Feb 1, 2005
Method and apparatus for controlling wafer thickness uniformity in a multi-zone vertical furnace
ADVANCED MICRO DEVICES INC9 citations73
US6819963B2Nov 16, 2004
Run-to-run control method for proportional-integral-derivative (PID) controller tuning for rapid thermal processing (RTP)
ADVANCED MICRO DEVICES INC11 citations73
US6352867B1Mar 5, 2002
Method of controlling feature dimensions based upon etch chemistry concentrations
ADVANCED MICRO DEVICES INC7 citations73
US6324341B1Nov 27, 2001
Lot-to-lot rapid thermal processing (RTP) chamber preheat optimization
ADVANCED MICRO DEVICES INC6 citations62