Inventor

WANG ZIYUN

US41 patents

⚠️ This page may combine multiple inventors who share the name “WANG ZIYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WANG ZIYUN

ADVANCED TECH MATERIALS

Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride

Composition and method for low temperature deposition of silicon-containing films

Composition and method for low temperature deposition of silicon-containing films

Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same

Pyrazolate copper complexes, and MOCVD of copper using same

Pyrazolate copper complexes, and MOCVD of copper using same

Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride

Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

Composition and method for low temperature deposition of silicon-containing films

Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same

Pyrazolate copper complexes, and MOCVD of copper using same

Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films

Silicon source reagent compositions, and method of making and using same for microelectronic device structure

Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films

Br2SbCH3 a solid source ion implant and CVD precursor

Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films

WANG ZIYUN

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

Composition and method for low temperature deposition of silicon-containing films

Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same

Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same

Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride

Silicon precursors and method for low temperature CVD of silicon-containing films

Silicon precursors and method for low temperature CVD of silicon-containing films

SAMSUNG ELECTRONICS CO LTD

Systems and methods for real-time state estimation of fast-moving objects

Method and apparatus for three-dimensional (3D) object and surface reconstruction

Trajectory generation of a robot using a neural network

UNIV JIANGNAN

Fault detection method for buck converter based on inverse kalman filter

Uncertain noisy filtering-based fault diagnosis method for power battery management system

State estimation method for power battery formation process based on convex space filtering

ENTEGRIS INC

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

AIR LIQUIDE

Methods for vapor deposition of group 4 transition metal-containing films using Group 4 transition metal-containing films forming compositions

Method for deposition of gallium-containing film with gallium precursors

GATINEAU SATOKO

Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process

UNIV NANJING AERONAUTICS & ASTRONAUTICS

Supersonic air intake passage capable of achieving synchronous adjustment of capturing area and throat area

AIR LIQUIDE ELECTRONICS US LP

Synthesis methods for carbosilanes

BLASCO NICOLAS

Method of forming a tantalum-containing layer on a substrate

WAN ZHIWEN

Synthesis method for carbosilanes