P

Inventor

YAMASHITA MASAMI

JP52 patents
⚠️ This page may combine multiple inventors who share the name “YAMASHITA MASAMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

16 patents
US6709523B1Mar 23, 2004

Silylation treatment unit and method

TOKYO ELECTRON LTD53 citations96
US10272478B2Apr 30, 2019

Substrate processing system, substrate cleaning method, and recording medium

TOKYO ELECTRON LTD7 citations83
US6485203B2Nov 26, 2002

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD17 citations83
US6872670B2Mar 29, 2005

Silylation treatment unit and method

TOKYO ELECTRON LTD6 citations74
US10998183B2May 4, 2021

Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium

TOKYO ELECTRON LTD2 citations73
US7401988B2Jul 22, 2008

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD7 citations73
US7208066B2Apr 24, 2007

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD7 citations73
US9818598B2Nov 14, 2017

Substrate cleaning method and recording medium

TOKYO ELECTRON LTD4 citations72
US7375831B2May 20, 2008

Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit

TOKYO ELECTRON LTD3 citations63
US10792711B2Oct 6, 2020

Substrate processing system, substrate cleaning method, and recording medium

TOKYO ELECTRON LTD1 citations62
US7529595B2May 5, 2009

Method of controlling substrate processing apparatus and substrate processing apparatus

TOKYO ELECTRON LTD4 citations62
US12550659B2Feb 10, 2026

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD1 citations59
US7947215B2May 24, 2011

Heat treatment apparatus, heat treatment method, and recording medium storing computer program carrying out the same

TOKYO ELECTRON LTD0 citations52
US7745347B2Jun 29, 2010

Heat treatment apparatus, heat treatment method, and recording medium storing computer program carrying out the same

TOKYO ELECTRON LTD0 citations52
US11594427B2Feb 28, 2023

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD0 citations51
US10256163B2Apr 9, 2019

Method of treating a microelectronic substrate using dilute TMAH

TOKYO ELECTRON LTD0 citations50

NEC LCD TECHNOLOGIES LTD

10 patents

ASAHI GLASS CO LTD

7 patents

SONY CORP

4 patents

RICOH MICROELECTRONICS COMPANY

2 patents

OKAMOTO MAMORU

2 patents

HITACHI LTD

1 patent

HAYASHIBARA BIOCHEM LAB

1 patent

ISOA INC

1 patent

NEC LCD TECHNOLOGIES

1 patent

SUMITOMO SPEC METALS

1 patent

KAIKOU TAKAYOSHI

1 patent

YAMAMOTO MASAYA

1 patent

AOBA KASEI KABUSHIKI KAISHA

1 patent

FURUNO ELECTRIC CO

1 patent

Showing the top 50 of 52 patents by PatentIndex Score.