Inventor
KUAN CHIYAN
US21 patents
⚠️ This page may combine multiple inventors who share the name “KUAN CHIYAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HERMES MICROVISION INC
10 patentsUS9436985B1Sep 6, 2016
Method and system for enhancing image quality
HERMES MICROVISION INC14 citations83
US9113538B2Aug 18, 2015
Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
HERMES MICROVISION INC9 citations83
US9002097B1Apr 7, 2015
Method and system for enhancing image quality
HERMES MICROVISION INC6 citations83
US10054556B2Aug 21, 2018
Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
HERMES MICROVISION INC3 citations72
US9572237B2Feb 14, 2017
Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
HERMES MICROVISION INC2 citations72
US10088438B2Oct 2, 2018
Method and system for inspecting an EUV mask
HERMES MICROVISION INC2 citations70
US9164399B2Oct 20, 2015
Reticle operation system
HERMES MICROVISION INC2 citations61
US9485846B2Nov 1, 2016
Method and system for inspecting an EUV mask
HERMES MICROVISION INC1 citations60
US9177758B2Nov 3, 2015
Charged particle beam apparatus
HERMES MICROVISION INC1 citations52
US9859089B2Jan 2, 2018
Method and system for inspecting and grounding an EUV mask
HERMES MICROVISION INC1 citations49
ASML NETHERLANDS BV
4 patentsUS10775325B2Sep 15, 2020
Method and system for inspecting an EUV mask
ASML NETHERLANDS BV2 citations70
US11448607B2Sep 20, 2022
Charged particle beam inspection of ungrounded samples
ASML NETHERLANDS BV0 citations62
US11662323B2May 30, 2023
Method and system for inspecting an EUV mask
ASML NETHERLANDS BV0 citations60
US12142451B2Nov 12, 2024
System for inspecting and grounding a mask in a charged particle system
ASML NETHERLANDS BV0 citations57
KUAN CHIYAN
4 patentsUS8295580B2Oct 23, 2012
Substrate and die defect inspection method
KUAN CHIYAN5 citations60
US8217349B2Jul 10, 2012
Method for inspecting EUV reticle and apparatus thereof
KUAN CHIYAN3 citations60
US8692193B2Apr 8, 2014
Method for inspecting EUV reticle and apparatus thereof
KUAN CHIYAN1 citations50
US8519333B2Aug 27, 2013
Charged particle system for reticle/wafer defects inspection and review
KUAN CHIYAN0 citations50