Inventor

PAN CHUNG-SHIH

US20 patents

⚠️ This page may combine multiple inventors who share the name “PAN CHUNG-SHIH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PAN CHUNG-SHIH

HERMES MICROVISION INC

Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask

Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask

Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask

Method and system for inspecting an EUV mask

Reticle operation system

Method and system for inspecting an EUV mask

Z-stage configuration and application thereof

Method and system for inspecting and grounding an EUV mask

Method and handling apparatus for placing patterning device on support member for charged particle beam imaging

Patterning device holding apparatus and application thereof

WANG YOU-JIN

Structure for discharging extreme ultraviolet mask

Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system

Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system

Discharging method for charged particle beam imaging

ASML NETHERLANDS BV

Method and system for inspecting an EUV mask

Method and system for inspecting an EUV mask

KLA INSTR CORP

Electron beam inspection system and method

JAU JACK

E-beam defect review system

HERMES MICROVISION TAIWAN INC

Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus

KUAN CHIYAN

Charged particle system for reticle/wafer defects inspection and review