Inventor

HUNG YU HSIANG

TW80 patents

⚠️ This page may combine multiple inventors who share the name “HUNG YU HSIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUNG YU HSIANG

UNITED MICROELECTRONICS CORP

Semiconductor device and method for fabricating the same

Semiconductor device and method of forming the same

Method for manufacturing finFET device

Semiconductor device having a metal gate

FinFET structure with cavities and semiconductor compound portions extending laterally over sidewall spacers

Semiconductor device and method for fabricating the same

Semiconductor device and method of forming the same

Semiconductor structure and fabrication method thereof

Fin-shaped structure and manufacturing method thereof

Static random access memory

Static random access memory

Semiconductor device and fabrication method thereof

Fin-shaped field-effect transistor (FinFET)

Epitaxial Process of forming stress inducing epitaxial layers in source and drain regions of PMOS and NMOS structures

Semiconductor device and manufacturing method thereof

Semiconductor device and method for fabricating the same

Method for fabricating cap layer on an epitaxial layer

Semiconductor device and method of forming the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Method for fabricating a Fin field effect transistor (FinFET)

Semiconductor device with gate structure having dielectric layer on one side and contact plug on the other side

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Method of fabricating semiconductor device

Semiconductor structure with aligning mark and method of forming the same

Method of manufacturing semiconductor devices

Semiconductor device and method of fabricating the same

Method of forming layout definition of semiconductor device

Processes for fabricating FinFET structures with semiconductor compound portions formed in cavities and extending over sidewall spacers

Fin-shaped structure and method thereof

Method for forming semiconductor device with low sealing loss

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and manufacturing method thereof

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Method of forming fin-shaped structure

Semiconductor structure and process thereof

Method of controlling etching process for forming epitaxial structure

Manufacturing method of semiconductor device including gate oxide layer

Semiconductor device including gate oxide layer

Semiconductor device including gate oxide layer and manufacturing method thereof

Semiconductor device including gate oxide layer and manufacturing method thereof

Method for fabricating semiconductor device

Method of forming semiconductor device

CHANG CHUNG-FU

Semiconductor process

WEI MING-TE

Semiconductor structure and fabrication method thereof

INSTITUTE OF NUCLEAR ENERGY RES ATOMIC ENERGY COUNCIL EXECUTIVE YUAN

Map creation system and method thereof for movable robot

HUANG SHIN-CHUAN

Method for fabricating semiconductor device