Inventor
FU SSU I
TW117 patents
⚠️ This page may combine multiple inventors who share the name “FU SSU I”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
43 patentsUS11062954B2Jul 13, 2021
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP11 citations94
US10607882B2Mar 31, 2020
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP12 citations94
US9735047B1Aug 15, 2017
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP30 citations94
US9349833B1May 24, 2016
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP32 citations94
US9123659B1Sep 1, 2015
Method for manufacturing finFET device
UNITED MICROELECTRONICS CORP30 citations94
US9287263B1Mar 15, 2016
Semiconductor device having a metal gate
UNITED MICROELECTRONICS CORP17 citations93
US9142641B1Sep 22, 2015
Method for manufacturing finFET
UNITED MICROELECTRONICS CORP21 citations93
US9166024B2Oct 20, 2015
FinFET structure with cavities and semiconductor compound portions extending laterally over sidewall spacers
UNITED MICROELECTRONICS CORP23 citations91
US10985264B2Apr 20, 2021
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP9 citations86
US11721591B2Aug 8, 2023
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations84
US10971397B2Apr 6, 2021
Semiconductor device and method of fabricating the same
UNITED MICROELECTRONICS CORP5 citations84
US10395991B2Aug 27, 2019
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP7 citations84
US10249488B1Apr 2, 2019
Semiconductor devices with same conductive type but different threshold voltages and method of fabricating the same
UNITED MICROELECTRONICS CORP12 citations84
US9905464B2Feb 27, 2018
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP9 citations84
US9793380B2Oct 17, 2017
Semiconductor structure and fabrication method thereof
UNITED MICROELECTRONICS CORP5 citations84
US9786510B2Oct 10, 2017
Fin-shaped structure and manufacturing method thereof
UNITED MICROELECTRONICS CORP5 citations84
US9589966B2Mar 7, 2017
Static random access memory
UNITED MICROELECTRONICS CORP9 citations84
US9455194B1Sep 27, 2016
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP7 citations84
US9379119B1Jun 28, 2016
Static random access memory
UNITED MICROELECTRONICS CORP15 citations84
US9054187B2Jun 9, 2015
Semiconductor structure
UNITED MICROELECTRONICS CORP8 citations84
US8993384B2Mar 31, 2015
Semiconductor device and fabrication method thereof
UNITED MICROELECTRONICS CORP7 citations84
US8981487B2Mar 17, 2015
Fin-shaped field-effect transistor (FinFET)
UNITED MICROELECTRONICS CORP7 citations84
US8895396B1Nov 25, 2014
Epitaxial Process of forming stress inducing epitaxial layers in source and drain regions of PMOS and NMOS structures
UNITED MICROELECTRONICS CORP14 citations84
US12068309B2Aug 20, 2024
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations73
US11901239B2Feb 13, 2024
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations73
US11710778B2Jul 25, 2023
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP1 citations73
US11495681B2Nov 8, 2022
Semiconductor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP2 citations73
US11152515B2Oct 19, 2021
Semiconductor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP3 citations73
US10566285B2Feb 18, 2020
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US10546922B2Jan 28, 2020
Method for fabricating cap layer on an epitaxial layer
UNITED MICROELECTRONICS CORP4 citations73
US10529825B2Jan 7, 2020
Semiconductor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP2 citations73
US10050146B2Aug 14, 2018
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP2 citations73
US10008569B2Jun 26, 2018
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US9916978B2Mar 13, 2018
Method for fabricating a Fin field effect transistor (FinFET)
UNITED MICROELECTRONICS CORP5 citations73
US9847398B1Dec 19, 2017
Semiconductor device with gate structure having dielectric layer on one side and contact plug on the other side
UNITED MICROELECTRONICS CORP4 citations73
US9773887B2Sep 26, 2017
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US9685385B1Jun 20, 2017
Method of fabricating semiconductor device
UNITED MICROELECTRONICS CORP4 citations73
US9659873B2May 23, 2017
Semiconductor structure with aligning mark and method of forming the same
UNITED MICROELECTRONICS CORP2 citations73
US9627268B2Apr 18, 2017
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP5 citations73
US9508715B1Nov 29, 2016
Semiconductor structure
UNITED MICROELECTRONICS CORP3 citations73
US9384978B1Jul 5, 2016
Method of forming trenches
UNITED MICROELECTRONICS CORP3 citations73
US9224864B1Dec 29, 2015
Semiconductor device and method of fabricating the same
UNITED MICROELECTRONICS CORP4 citations73
US9601600B2Mar 21, 2017
Processes for fabricating FinFET structures with semiconductor compound portions formed in cavities and extending over sidewall spacers
UNITED MICROELECTRONICS CORP3 citations72
TSAI SHIH-HUNG
2 patentsFU SSU-I
2 patentsCHEN YING-TSUNG
2 patentsLIU AN-CHI
1 patentShowing the top 50 of 117 patents by PatentIndex Score.