Inventor

LIU SU-HAO

TW83 patents

⚠️ This page may combine multiple inventors who share the name “LIU SU-HAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIU SU-HAO

TAIWAN SEMICONDUCTOR MFG CO LTD

Strained and uniform doping technique for FINFETs

Field effect transistor contact with reduced contact resistance using implantation process

Semiconductor device having a contact plug with an air gap spacer

Source/drain structure

Field effect transistor contact with reduced contact resistance

Semiconductor device and methods of forming the same

Semiconductor structure with doped via plug and method for forming the same

Sacrificial layer for semiconductor process

Sacrificial layer for semiconductor process

Source/drain structure

Melt anneal source and drain regions

Field effect transistor contact with reduced contact resistance using implantation process

Field effect transistor contact with reduced contact resistance

Doping for semiconductor device with conductive feature

Field effect transistor contact with reduced contact resistance

Metal loss prevention using implantation

Semiconductor structure with doped contact plug and method for forming the same

Metal loss prevention using implantation

Semiconductor structure with doped via plug

Semiconductor device with connecting structure having a doped layer and method for forming the same

Semiconductor device and method of manufacture

Metal layer protection during wet etching

Sacrificial layer for semiconductor process

Variable size fin structures

Semiconductor device and method for forming the same

Metal layer protection during wet etching

Source/drain structure

Semiconductor device with connecting structure having a doped layer and method for forming the same

Semiconductor device and method for forming the same

Semiconductor device and method of manufacture

Source/drain structure

Variable size fin structures

Formation method of semiconductor device with low resistance contact

Semiconductor device and methods of forming the same

Device having an air gap adjacent to a contact plug and covered by a doped dielectric layer

Method for manufacturing semiconductor device

Methods of forming semiconductor device

Semiconductor device and method

Bottom lateral expansion of contact plugs through implantation

Transistor contacts and methods of forming the same

Reducing spacing between conductive features through implantation

Field effect transistor contact with reduced contact resistance

Metal loss prevention using implantation

Doping for semiconductor device with conductive feature

Semiconductor device and methods of forming the same

TAIWAN SEMICONDUCTOR MFG

Mechanisms for doping lightly-doped-drain (LDD) regions of finFET devices

Integrated circuits and methods of forming integrated circuits

Mechanisms for forming stressor regions in a semiconductor device

TSAI CHUN HSIUNG

Mechanisms for forming stressor regions in a semiconductor device

Integrated circuits