Inventor
SONG HYUN-JI
KR27 patents
⚠️ This page may combine multiple inventors who share the name “SONG HYUN-JI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG SDI CO LTD
13 patentsUS10066057B2Sep 4, 2018
Organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD2 citations70
US9971243B2May 15, 2018
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD2 citations70
US10312074B2Jun 4, 2019
Method of producing layer structure, layer structure, and method of forming patterns
SAMSUNG SDI CO LTD2 citations68
US9348229B2May 24, 2016
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD2 citations61
US9683114B2Jun 20, 2017
Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations50
US12554199B2Feb 17, 2026
Resist topcoat composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations49
US9568825B2Feb 14, 2017
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations49
US12590221B2Mar 31, 2026
Resist topcoat composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations48
US10332751B2Jun 25, 2019
Monomer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations39
US10018914B2Jul 10, 2018
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations39
US9371444B2Jun 21, 2016
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations39
US10323124B2Jun 18, 2019
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations38
US9908990B2Mar 6, 2018
Organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations36
SAMSUNG ELECTRONICS CO LTD
4 patentsUS10788874B2Sep 29, 2020
Method and electronic device for controlling power between electronic devices
SAMSUNG ELECTRONICS CO LTD2 citations70
US12429768B2Sep 30, 2025
Photosensitizing compound, photoresist composition including the same, and method of manufacturing integrated circuit device
SAMSUNG ELECTRONICS CO LTD0 citations51
US12500079B2Dec 16, 2025
Semiconductor device manufacturing method
SAMSUNG ELECTRONICS CO LTD0 citations49
US12557370B2Feb 17, 2026
Semiconductor device manufacturing method
SAMSUNG ELECTRONICS CO LTD0 citations48
CHEIL IND INC
2 patentsUS9738787B2Aug 22, 2017
Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer
CHEIL IND INC0 citations51
US9890255B2Feb 13, 2018
Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming
CHEIL IND INC0 citations49
PARK EUN-SU
2 patentsUS9574108B2Feb 21, 2017
Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer
PARK EUN-SU0 citations37
US9362030B2Jun 7, 2016
Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer
PARK EUN-SU0 citations37
BAE JIN-HEE
2 patentsUS9312122B2Apr 12, 2016
Rinse liquid for insulating film and method of rinsing insulating film
BAE JIN-HEE0 citations33
US9240443B2Jan 19, 2016
Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agent
BAE JIN-HEE0 citations33