Inventor
ZACZEK CHRISTOPH
DE24 patents
⚠️ This page may combine multiple inventors who share the name “ZACZEK CHRISTOPH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
9 patentsUS7460206B2Dec 2, 2008
Projection objective for immersion lithography
ZEISS CARL SMT AG71 citations95
US7583443B2Sep 1, 2009
Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the same
ZEISS CARL SMT AG15 citations83
US6863398B2Mar 8, 2005
Method and coating system for coating substrates for optical components
ZEISS CARL SMT AG8 citations71
US7518797B2Apr 14, 2009
Microlithographic exposure apparatus
ZEISS CARL SMT AG2 citations62
US6842294B2Jan 11, 2005
Catadioptric objective
ZEISS CARL SMT AG5 citations62
US7659976B2Feb 9, 2010
Devices and methods for inspecting optical elements with a view to contamination
ZEISS CARL SMT AG2 citations61
US7239447B2Jul 3, 2007
Objective with crystal lenses
ZEISS CARL SMT AG4 citations61
US7093937B2Aug 22, 2006
Optical component and coating system for coating substrates for optical components
ZEISS CARL SMT AG2 citations60
US7382536B2Jun 3, 2008
Objective with fluoride crystal lenses
ZEISS CARL SMT AG0 citations51
ZEISS CARL SMT GMBH
7 patentsUS9146475B2Sep 29, 2015
Projection exposure system and projection exposure method
ZEISS CARL SMT GMBH3 citations60
US12117731B2Oct 15, 2024
Method for producing a mirror of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations55
US10578976B2Mar 3, 2020
Catadioptric projection objective including a reflective optical component and a measuring device
ZEISS CARL SMT GMBH0 citations52
US8049964B2Nov 1, 2011
Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element
ZEISS CARL SMT GMBH0 citations51
US11520087B2Dec 6, 2022
Reflective optical element
ZEISS CARL SMT GMBH0 citations50
US8546776B2Oct 1, 2013
Optical system for EUV lithography with a charged-particle source
ZEISS CARL SMT GMBH1 citations49
US9915876B2Mar 13, 2018
EUV mirror and optical system comprising EUV mirror
ZEISS CARL SMT GMBH0 citations40
PAZIDIS ALEXANDRA
2 patentsUS8488103B2Jul 16, 2013
Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same
PAZIDIS ALEXANDRA3 citations60
US8435726B2May 7, 2013
Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus
PAZIDIS ALEXANDRA0 citations48