Inventor

NODA KAZUMI

JP27 patents

⚠️ This page may combine multiple inventors who share the name “NODA KAZUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NODA KAZUMI

SHINETSU CHEMICAL CO

Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer

Positive resist material and pattern formation method using the same

Photo-curable resin composition, patterning process, and substrate protecting film

Nitrogen-containing organic compound, resist composition and patterning process

Nitrogen-containing organic compound, chemically amplified resist composition and patterning process

Purification of polysilane

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Organic film composition, process for forming organic film, patterning process, and compound

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition

Antireflective coating composition, antireflective coating, and patterning process

Resist composition and patterning process using the same

Antireflection film composition and patterning process using the same

Lift-off resist compositions

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Resist composition and patterning process

Material for forming organic film, method for forming organic film, patterning process, and compound

OHASHI MASAKI

Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film

Near-infrared absorptive layer-forming composition and multilayer film

TACHIBANA SEIICHIRO

Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer

Antireflective coating composition, antireflective coating, and patterning process

HATAKEYAMA JUN

Resist lower layer film-formed substrate

SHIN ESTU CHEMICAL CO LTD

Silicon-containing resist composition and patterning process

TAKEMURA KATSUYA

Double patterning process

MITA INDUSTRIAL CO LTD

Coupling mechanism for use in a semi-openable document presser of an image forming apparatus

NAKASHIMA MUTSUO

Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing