Inventor

NAKAJIMA MAKOTO

JP103 patents

⚠️ This page may combine multiple inventors who share the name “NAKAJIMA MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAKAJIMA MAKOTO

NISSAN CHEMICAL IND LTD

Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating

Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group

Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore

Coating composition for pattern reversal on soc pattern

Underlayer film-forming composition for self-assembled films

Resist underlayer film forming composition containing silicon having anion group

Radiation sensitive composition

Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore

Composition for coating resist pattern

Resist underlayer film forming composition containing silicon having ester group

Method for manufacturing semiconductor device using quadruple-layer laminate

SUNTORY HOLDINGS LTD

Beverage containing tea polymerized polyphenol and RebD and/or RebM

Beverage containing catechin compound(s) and RebD and/or RebM

Stevia-containing beverage

Stevia-containing beverage

Beverage containing catechin compound(s) and RebD and/or RebM

Beverage containing tea polymerized polyphenol and RebD and/or RebM

FUJIKOSHI KIKAI KOGYO KK

Polishing machine

Polishing system for polishing wafer

Polishing machine

NAKAJIMA MAKOTO

Resist underlayer film forming composition containing silicon having nitrogen-containing ring

Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group

Silicon-containing resist underlayer film forming composition having urea group

FUJIKOSHI MACHINERY CORP

Cloth cleaning device and polishing machine

Polishing apparatus

Polishing apparatus

JANOME SEWING MACHINE CO LTD

Cord guide device and sewing machine provided with same

Sewing machine

Sewing machine

NISSAN CHEMICAL CORP

Resist underlayer film-forming composition using carbon-oxygen double bond

Resist underlayer film-forming composition

Method for producing resist pattern coating composition with use of solvent replacement method

TOSHIBA TEC KK

Pulse width modulation system and image forming apparatus having the pulse width modulation system

Pulse width modulation system and image forming apparatus having the pulse width modulation system

SHIBAYAMA WATARU

Resist underlayer film forming composition containing silicon having anion group

Resist underlayer film forming composition containing silicone having onium group

NAKAO YOSHIHIRO

Beverage extraction apparatus

Beverage extraction apparatus

SAMSUNG ELECTRONICS CO LTD

Substrate treating composition and method for fabricating a semiconductor device using the same

Substrate treating composition and method for fabricating a semiconductor device using the same

FUJITSU LTD

Process for forming contact through holes

NIPPON FINE CHEMICAL CO

Oil materials comprising dimerdiol ester and cosmetics comprising the ester

ADVANCED TECH MATERIALS

Resist, barc and gap fill material stripping chemical and method

HITACHI LTD

Semiconductor device and production process thereof, as well as wire bonding device used therefor

TOKYO ELECTRON LTD

Vertical heat treatment device and method controlling the same

MITSUBISHI CHEM IND

Method for the preparation of powdered rubber

TAJIMAYA FOODS CO LTD

Mayonnaise-like food and method of manufacturing the same

KANNO YUTA

Silicon-containing composition having sulfonamide group for forming resist underlayer film

MITSUBISHI HEAVY IND LTD

Internal structure of nuclear reactor with coolant flow stabilizing facility

NISSAN MOTOR

Electronic fuel injection system for internal combustion engine