Inventor
SHINOHARA KAZUYOSHI
JP18 patents
⚠️ This page may combine multiple inventors who share the name “SHINOHARA KAZUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS10475638B2Nov 12, 2019
Substrate processing apparatus, substrate processing method, and computer-readable recording medium having stored thereon substrate processing program
TOKYO ELECTRON LTD3 citations72
US12027394B2Jul 2, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD1 citations71
US11676835B2Jun 13, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations71
US12588461B2Mar 24, 2026
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11551935B2Jan 10, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US10685858B2Jun 16, 2020
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US10192758B2Jan 29, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US9805957B2Oct 31, 2017
Substrate processing apparatus, substrate processing method and computer-readable storage medium recording therein substrate processing program
TOKYO ELECTRON LTD0 citations51
US9768039B2Sep 19, 2017
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations51
US12532693B2Jan 20, 2026
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations50
US11569086B2Jan 31, 2023
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations50
US11769661B2Sep 26, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations47
US10937669B2Mar 2, 2021
Substrate solution-treatment apparatus, treatment solution supplying method and storage medium
TOKYO ELECTRON LTD0 citations47
US10832902B2Nov 10, 2020
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations41
US9764345B2Sep 19, 2017
Substrate processing apparatus and nozzle cleaning method
TOKYO ELECTRON LTD0 citations41