Inventor

KHANNA DINESH N

US49 patents

⚠️ This page may combine multiple inventors who share the name “KHANNA DINESH N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KHANNA DINESH N

HOECHST CELANESE CORP

Hydroxy polyimides and high temperature positive photoresists therefrom

Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use

Photosensitive polyimide polymer compositions

Base developable negative acting photoresists

Polyamide-polyimide and polybenzoxazole-polyimide polymer

Polyamide-polyimide and polybenzoxazole-polyimide polymer

Heat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ether

Heat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethers

Aqueous antireflective coatings for photoresist compositions

Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom

Polyamide containing the hexafluoroisopropylidene group

Polyamide containing the hexafluoroisopropylidene group with O-quinone diazide in positive working photoresist

Polymers prepared from 4,4&#39;-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride

Crosslinkable polyimides from bis (aminophenoxy) benzonitriles

Bis-n,n&#39; nitro or amino benzoyl amino phenols

Polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymer having at least one fluorine-containing linking group

Polester of bis(2-(hydroxyphenyl)-hexafluoroisopropyl)diphenyl ether

Polyamide containing the hexafluoroisopropylidene group and process of using to form a positive image

Polymers prepared from 4,4&#39;-bis(2-(amino(halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether

Process for insolublizing solvent soluble polyimide compositions

Photoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers

High molecular weight, thermally soluble polyimides

Polyamide-polyamide and polybenzoxazole-polyamide polymer

Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester

Polymers prepared from 4,4&#39;-bis(2-[3,4(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride

Polymers prepared from 4,4&#39;-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether

Novolak resin mixtures

Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride

Process of making naphthoquinone diazide esters using lactone solvents

Process of making a stable solution of poly(hydroxystyrene) functionalized with t-butyloxycarbonyl groups

CLARIANT FINANCE BVI LTD

Light absorbing polymers

Antireflective coating for photoresist compositions

Antireflective coating compositions for photoresist compositions and use thereof

Antireflective coating for photoresist compositions

Composition for stripping photoresist and organic materials from substrate surfaces

Antireflective coating material for photoresists

Positive photoresists containing novel photoactive compounds

Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate

Light sensitive composition containing an arylhydrazo dye

Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition

Method for synthesizing polymeric AZO dyes

Photosensitive quinolone compounds and a process of preparation

Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers

Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

CABOT MICROELECTRONICS CORP

Polishing composition for a tungsten-containing substrate

Method of polishing a tungsten-containing substrate

KHANNA DINESH N

Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers

Polymers prepared from 4,4'-bis[2-(3,4-(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride

Bis-n,n' nitro or amino benzoyl amino phenols

Polymers prepared from 4,4'-bis(2-(amino(halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether

Polymers prepared from 4,4'-bis(2-[3,4(dicarboxyphenyl)hexafluoroisopropyl] diphenyl ether dianhydride

Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether