P

Inventor

KITANO JUNICHI

JP51 patents
⚠️ This page may combine multiple inventors who share the name “KITANO JUNICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

34 patents
US6620251B2Sep 16, 2003

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD500 citations99
US5876280AMar 2, 1999

Substrate treating system and substrate treating method

TOKYO ELECTRON LTD91 citations97
US6633022B2Oct 14, 2003

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD21 citations93
US6632281B2Oct 14, 2003

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD15 citations93
US6585430B2Jul 1, 2003

System and method for coating and developing

TOKYO ELECTRON LTD42 citations93
US6518199B2Feb 11, 2003

Method and system for coating and developing

TOKYO ELECTRON LTD31 citations93
US6955485B2Oct 18, 2005

Developing method and developing unit

TOKYO ELECTRON LTD17 citations92
US6333003B1Dec 25, 2001

Treatment apparatus, treatment method, and impurity removing apparatus

TOKYO ELECTRON LTD39 citations92
US6063439AMay 16, 2000

Processing apparatus and method using solution

TOKYO ELECTRON LTD45 citations92
US5944894AAug 31, 1999

Substrate treatment system

TOKYO ELECTRON LTD54 citations92
US5928390AJul 27, 1999

Vertical processing apparatus

TOKYO ELECTRON LTD45 citations92
US6617095B2Sep 9, 2003

Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern

TOKYO ELECTRON LTD21 citations91
US5434644AJul 18, 1995

Filter device

TOKYO ELECTRON LTD43 citations88
US8366872B2Feb 5, 2013

Substrate treatment method, coating film removing apparatus, and substrate treatment system

TOKYO ELECTRON LTD16 citations84
US7959988B2Jun 14, 2011

Coating film forming apparatus and method

TOKYO ELECTRON LTD8 citations84
US7926441B2Apr 19, 2011

Substrate treatment method, coating treatment apparatus, and substrate treatment system

TOKYO ELECTRON LTD13 citations84
US6875281B2Apr 5, 2005

Method and system for coating and developing

TOKYO ELECTRON LTD12 citations84
US6467976B2Oct 22, 2002

Coating and developing system

TOKYO ELECTRON LTD18 citations84
US6875466B2Apr 5, 2005

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD14 citations83
US6485203B2Nov 26, 2002

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD17 citations83
US6884298B2Apr 26, 2005

Method and system for coating and developing

TOKYO ELECTRON LTD6 citations74
US7401988B2Jul 22, 2008

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD7 citations73
US7208066B2Apr 24, 2007

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD7 citations73
US11430675B2Aug 30, 2022

Substrate processing apparatus and processing liquid reuse method

TOKYO ELECTRON LTD1 citations62
US10026629B2Jul 17, 2018

Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium storing substrate liquid processing program

TOKYO ELECTRON LTD2 citations62
US8053180B2Nov 8, 2011

Developing method and developing unit

TOKYO ELECTRON LTD1 citations62
US7977039B2Jul 12, 2011

Rinse treatment method, developing treatment method and developing apparatus

TOKYO ELECTRON LTD6 citations61
US7486377B2Feb 3, 2009

Developing method and developing apparatus

TOKYO ELECTRON LTD5 citations61
US7924396B2Apr 12, 2011

Coating/developing apparatus and pattern forming method

TOKYO ELECTRON LTD3 citations58
US11410861B2Aug 9, 2022

Substrate liquid processing apparatus

TOKYO ELECTRON LTD0 citations52
US7857530B2Dec 28, 2010

Developing method and developing unit

TOKYO ELECTRON LTD0 citations51
US7794924B2Sep 14, 2010

Developing method and developing unit

TOKYO ELECTRON LTD0 citations51
US7427168B2Sep 23, 2008

Developing method and developing unit

TOKYO ELECTRON LTD0 citations51
US8054443B2Nov 8, 2011

Developing method and developing apparatus

TOKYO ELECTRON LTD0 citations50

KITANO JUNICHI

5 patents
USD732326SJun 23, 2015

Beer dispenser

KITANO JUNICHI11 citations83
US8733592B2May 27, 2014

Liquid delivery system, liquid-delivery switching device, and liquid-flowpath regulating device

KITANO JUNICHI5 citations72
US9103451B2Aug 11, 2015

Device for stopping flow of fluid

KITANO JUNICHI2 citations62
USD731838SJun 16, 2015

Beer dispenser

KITANO JUNICHI3 citations62
USD728306SMay 5, 2015

Beer dispenser

KITANO JUNICHI2 citations61

ASAHI GROUP HOLDINGS LTD

4 patents
US11718515B2Aug 8, 2023

Liquid sale management device

ASAHI GROUP HOLDINGS LTD3 citations72
US11332357B2May 17, 2022

Liquid quality control device

ASAHI GROUP HOLDINGS LTD1 citations62
US11498825B2Nov 15, 2022

Liquid quality managing device and method

ASAHI GROUP HOLDINGS LTD1 citations56
US12540068B2Feb 3, 2026

Liquid supply system

ASAHI GROUP HOLDINGS LTD0 citations51

TOKAI RYOKAKU TETSUDO KK

2 patents
US6518718B2Feb 11, 2003

Speed electromotive force phase control system adapted to low speed

TOKAI RYOKAKU TETSUDO KK16 citations80
US6515440B2Feb 4, 2003

Departure control system using simulated phase

TOKAI RYOKAKU TETSUDO KK5 citations58

KYOUDA HIDEHARU

2 patents
US8111372B2Feb 7, 2012

Coating film forming apparatus and coating film forming method for immersion light exposure

KYOUDA HIDEHARU2 citations58
US8083959B2Dec 27, 2011

Substrate processing method, substrate processing system, and computer-readable storage medium

KYOUDA HIDEHARU0 citations48

TOYKO ELECTRON LTD

1 patent
US6620248B2Sep 16, 2003

Coating apparatus and mixing apparatus

TOYKO ELECTRON LTD2 citations62

ASAHI BREWERIES LTD

1 patent
US9272894B2Mar 1, 2016

Liquid delivery system and liquid-flowpath regulating device

ASAHI BREWERIES LTD0 citations52

TSUTSUMI KENJI

1 patent
US8703400B2Apr 22, 2014

Substrate treatment method, coating treatment apparatus, and substrate treatment system

TSUTSUMI KENJI0 citations50

Showing the top 50 of 51 patents by PatentIndex Score.