P

Inventor

KOMINO MITSUAKI

JP25 patents

Patents

25 patents
US6264788B1Jul 24, 2001

Plasma treatment method and apparatus

TOKYO ELECTRON LTD125 citations99
US6156151ADec 5, 2000

Plasma processing apparatus

TOKYO ELECTRON LTD498 citations99
US5769952AJun 23, 1998

Reduced pressure and normal pressure treatment apparatus

TOKYO ELECTRON LTD545 citations99
US5584971ADec 17, 1996

Treatment apparatus control method

TOKYO ELECTRON LTD127 citations99
US5575853ANov 19, 1996

Vacuum exhaust system for processing apparatus

TOKYO ELECTRON LTD210 citations99
US6544380B2Apr 8, 2003

Plasma treatment method and apparatus

TOKYO ELECTRON LTD104 citations98
US6134807AOct 24, 2000

Drying processing method and apparatus using same

TOKYO ELECTRON LTD557 citations98
US5665166ASep 9, 1997

Plasma processing apparatus

TOKYO ELECTRON LTD190 citations98
US5567267AOct 22, 1996

Method of controlling temperature of susceptor

TOKYO ELECTRON LTD261 citations98
US5478429ADec 26, 1995

Plasma process apparatus

TOKYO ELECTRON LTD473 citations98
US5382311AJan 17, 1995

Stage having electrostatic chuck and plasma processing apparatus using same

TOKYO ELECTRON LTD1,031 citations98
US5376213ADec 27, 1994

Plasma processing apparatus

TOKYO ELECTRON LTD181 citations98
US7337745B1Mar 4, 2008

Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor

TOKYO ELECTRON LTD83 citations97
US7033444B1Apr 25, 2006

Plasma processing apparatus, and electrode structure and table structure of processing apparatus

TOKYO ELECTRON LTD129 citations97
US5625526AApr 29, 1997

Electrostatic chuck

TOKYO ELECTRON LTD193 citations97
US6634845B1Oct 21, 2003

Transfer module and cluster system for semiconductor manufacturing process

TOKYO ELECTRON LTD71 citations96
US6431115B2Aug 13, 2002

Plasma treatment method and apparatus

TOKYO ELECTRON LTD27 citations96
US6106737AAug 22, 2000

Plasma treatment method utilizing an amplitude-modulated high frequency power

TOKYO ELECTRON LTD66 citations96
US5581874ADec 10, 1996

Method of forming a bonding portion

TOKYO ELECTRON LTD99 citations96
US5753891AMay 19, 1998

Treatment apparatus

TOKYO ELECTRON LTD74 citations95
US6379756B2Apr 30, 2002

Plasma treatment method and apparatus

TOKYO ELECTRON LTD15 citations92
US6167323ADec 26, 2000

Method and system for controlling gas system

TOKYO ELECTRON LTD23 citations92
US6157774ADec 5, 2000

Vapor generating method and apparatus using same

TOKYO ELECTRON LTD36 citations92
US6131307AOct 17, 2000

Method and device for controlling pressure and flow rate

TOKYO ELECTRON LTD23 citations92
US5660740AAug 26, 1997

Treatment apparatus control method

TOKYO ELECTRON LTD42 citations92