Inventor
OBSZARNY CHRISTOPHER E
US6 patents
Patents
6 patentsUS6429667B1Aug 6, 2002
Electrically testable process window monitor for lithographic processing
IBM35 citations91
US6163367ADec 19, 2000
Apparatus and method for in-situ adjustment of light transmission in a photolithography process
IBM46 citations90
US5905019AMay 18, 1999
Thin resist process by sub-threshold exposure
IBM31 citations90
US7810033B2Oct 5, 2010
Methods and systems involving text analysis
IBM20 citations82
US6176967B1Jan 23, 2001
Reactive ion etch chamber wafer masking system
IBM12 citations71
US6127686AOct 3, 2000
Thin resist process by sub-threshold exposure
IBM0 citations49