Inventor
DINGER UDO
DE46 patents
⚠️ This page may combine multiple inventors who share the name “DINGER UDO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
19 patentsUS6600552B2Jul 29, 2003
Microlithography reduction objective and projection exposure apparatus
ZEISS CARL SMT AG49 citations96
US7375798B2May 20, 2008
Projection system for EUV lithography
ZEISS CARL SMT AG25 citations93
US7355678B2Apr 8, 2008
Projection system for EUV lithography
ZEISS CARL SMT AG25 citations93
US7186983B2Mar 6, 2007
Illumination system particularly for microlithography
ZEISS CARL SMT AG21 citations93
US7151592B2Dec 19, 2006
Projection system for EUV lithography
ZEISS CARL SMT AG34 citations93
US6985210B2Jan 10, 2006
Projection system for EUV lithography
ZEISS CARL SMT AG34 citations93
US6902283B2Jun 7, 2005
Microlithography reduction objective and projection exposure apparatus
ZEISS CARL SMT AG37 citations93
USRE42118EFeb 8, 2011
Projection system for EUV lithography
ZEISS CARL SMT AG20 citations92
US6867913B2Mar 15, 2005
6-mirror microlithography projection objective
ZEISS CARL SMT AG31 citations92
US7623620B2Nov 24, 2009
Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm
ZEISS CARL SMT AG26 citations91
US7118449B1Oct 10, 2006
Method of manufacturing an optical element
ZEISS CARL SMT AG33 citations91
US7348565B2Mar 25, 2008
Illumination system particularly for microlithography
ZEISS CARL SMT AG10 citations84
US6700952B2Mar 2, 2004
Optical apparatus for diffracting radiation having wavelength ≦160 nm
ZEISS CARL SMT AG14 citations83
US7481543B1Jan 27, 2009
Mirror for use in a projection exposure apparatus
ZEISS CARL SMT AG8 citations82
US7557902B2Jul 7, 2009
Projection objective
ZEISS CARL SMT AG10 citations81
US7456408B2Nov 25, 2008
Illumination system particularly for microlithography
ZEISS CARL SMT AG6 citations74
US7592598B2Sep 22, 2009
Illumination system particularly for microlithography
ZEISS CARL SMT AG2 citations63
US7443948B2Oct 28, 2008
Illumination system particularly for microlithography
ZEISS CARL SMT AG2 citations62
US7077533B2Jul 18, 2006
Reflecting device for electromagnetic waves
ZEISS CARL SMT AG6 citations61
ZEISS CARL SMT GMBH
11 patentsUS7977651B2Jul 12, 2011
Illumination system particularly for microlithography
ZEISS CARL SMT GMBH15 citations84
US9996012B2Jun 12, 2018
Facet mirror for use in a projection exposure apparatus for microlithography
ZEISS CARL SMT GMBH2 citations72
US10261424B2Apr 16, 2019
Lithography apparatus and method for operating a lithography apparatus
ZEISS CARL SMT GMBH2 citations71
US8976927B2Mar 10, 2015
Substrate for mirrors for EUV lithography
ZEISS CARL SMT GMBH6 citations71
US9442383B2Sep 13, 2016
EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method
ZEISS CARL SMT GMBH3 citations69
US11303092B2Apr 12, 2022
Radiation source and device for feeding back emitted radiation to a laser source
ZEISS CARL SMT GMBH0 citations63
US11199780B2Dec 14, 2021
Reflective optical element for EUV lithography and method for adapting a geometry of a component
ZEISS CARL SMT GMBH0 citations63
US9444214B2Sep 13, 2016
Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance system
ZEISS CARL SMT GMBH2 citations63
US7910900B2Mar 22, 2011
Collector for an illumination system
ZEISS CARL SMT GMBH2 citations62
US9997268B2Jun 12, 2018
EUV-mirror, optical system with EUV-mirror and associated operating method
ZEISS CARL SMT GMBH1 citations48
US9448490B2Sep 20, 2016
EUV lithography system
ZEISS CARL SMT GMBH0 citations39
ZEISS STIFTUNG
6 patentsUS6438199B1Aug 20, 2002
Illumination system particularly for microlithography
ZEISS STIFTUNG199 citations99
US6198793B1Mar 6, 2001
Illumination system particularly for EUV lithography
ZEISS STIFTUNG236 citations99
US6244717B1Jun 12, 2001
Reduction objective for extreme ultraviolet lithography
ZEISS STIFTUNG103 citations98
US5982558ANov 9, 1999
REMA objective for microlithographic projection exposure systems
ZEISS STIFTUNG45 citations91
US6577443B2Jun 10, 2003
Reduction objective for extreme ultraviolet lithography
ZEISS STIFTUNG30 citations89
US6495839B1Dec 17, 2002
Microlithography projection objective and projection exposure apparatus
ZEISS STIFTUNG11 citations74
DINGER UDO
4 patentsUS9411241B2Aug 9, 2016
Facet mirror for use in a projection exposure apparatus for microlithography
DINGER UDO11 citations82
US8934085B2Jan 13, 2015
Bundle-guiding optical collector for collecting the emission of a radiation source
DINGER UDO7 citations80
US8710471B2Apr 29, 2014
Projection illumination system for EUV microlithography
DINGER UDO3 citations62
US8253927B2Aug 28, 2012
Optical element with multiple primary light sources
DINGER UDO1 citations51