Inventor
SAENGER INGO
DE30 patents
⚠️ This page may combine multiple inventors who share the name “SAENGER INGO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
27 patentsUS9955563B2Apr 24, 2018
EUV light source for generating a usable output beam for a projection exposure apparatus
ZEISS CARL SMT GMBH2 citations72
US9645503B2May 9, 2017
Collector
ZEISS CARL SMT GMBH5 citations72
US9632413B2Apr 25, 2017
Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
ZEISS CARL SMT GMBH2 citations72
US9551941B2Jan 24, 2017
Illumination system for an EUV lithography device and facet mirror therefor
ZEISS CARL SMT GMBH4 citations72
US10151982B2Dec 11, 2018
Illumination system of a microlithographic projection exposure apparatus with a birefringent element
ZEISS CARL SMT GMBH2 citations71
US9678432B2Jun 13, 2017
Optical assembly for increasing the etendue
ZEISS CARL SMT GMBH2 citations71
US9678439B2Jun 13, 2017
Mirror
ZEISS CARL SMT GMBH3 citations68
US9946161B2Apr 17, 2018
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
ZEISS CARL SMT GMBH1 citations51
US9665008B2May 30, 2017
Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography
ZEISS CARL SMT GMBH1 citations51
US9507269B2Nov 29, 2016
Illumination optical unit for projection lithography
ZEISS CARL SMT GMBH1 citations51
US9442385B2Sep 13, 2016
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
ZEISS CARL SMT GMBH0 citations51
US9411245B2Aug 9, 2016
Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US9323156B2Apr 26, 2016
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US8917433B2Dec 23, 2014
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US8891060B2Nov 18, 2014
Optical system, in particular of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US9405202B2Aug 2, 2016
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US10041836B2Aug 7, 2018
Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement
ZEISS CARL SMT GMBH0 citations41
US9817317B2Nov 14, 2017
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9588433B2Mar 7, 2017
Optical system, in particular of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9581910B2Feb 28, 2017
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9500956B2Nov 22, 2016
Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure
ZEISS CARL SMT GMBH0 citations41
US9488918B2Nov 8, 2016
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
ZEISS CARL SMT GMBH0 citations41
US9477025B2Oct 25, 2016
EUV light source for generating a used output beam for a projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9195057B2Nov 24, 2015
Illumination optical unit for a projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9182677B2Nov 10, 2015
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US8922753B2Dec 30, 2014
Optical system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9140994B2Sep 22, 2015
Method for adjusting an optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations31