Inventor
NAGATA YOSHIHIKO
JP31 patents
⚠️ This page may combine multiple inventors who share the name “NAGATA YOSHIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
24 patentsUS5378514AJan 3, 1995
Frame-supported pellicle for photolithography
SHINETSU CHEMICAL CO36 citations93
US5286567AFeb 15, 1994
Pellicle for photolithographic mask
SHINETSU CHEMICAL CO34 citations93
US5693382ADec 2, 1997
Frame-supported pellicle for dustproof protection of photomask in photolithography
SHINETSU CHEMICAL CO36 citations92
US5691088ANov 25, 1997
Pellicle for protection of photolithographic mask
SHINETSU CHEMICAL CO26 citations92
US5616927AApr 1, 1997
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO30 citations92
US5209996AMay 11, 1993
Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same
SHINETSU CHEMICAL CO27 citations92
US5139633AAug 18, 1992
Film-forming on substrate by sputtering
SHINETSU CHEMICAL CO28 citations92
US5470621ANov 28, 1995
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO34 citations91
US5300348AApr 5, 1994
Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive
SHINETSU CHEMICAL CO20 citations84
US6396579B1May 28, 2002
Method, apparatus, and system for inspecting transparent objects
SHINETSU CHEMICAL CO17 citations77
US7067222B2Jun 27, 2006
Pellicle for lithography
SHINETSU CHEMICAL CO6 citations74
US5327808AJul 12, 1994
Method for the preparation of a frame-supported pellicle for photolithography
SHINETSU CHEMICAL CO14 citations74
US5326649AJul 5, 1994
X-ray transmitting membrane for mask in x-ray lithography and method for preparing the same
SHINETSU CHEMICAL CO17 citations74
US5234609AAug 10, 1993
X-ray permeable membrane for X-ray lithographic mask
SHINETSU CHEMICAL CO14 citations74
US5199055AMar 30, 1993
X-ray lithographic mask blank with reinforcement
SHINETSU CHEMICAL CO14 citations74
US5419972AMay 30, 1995
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO15 citations72
US5368675ANov 29, 1994
Method for the preparation of a frame-supported pellicle for photolithography
SHINETSU CHEMICAL CO6 citations63
US5308567AMay 3, 1994
Method for the preparation of a resin membrane
SHINETSU CHEMICAL CO2 citations63
US5246802ASep 21, 1993
X-ray permeable membrane for X-ray lithographic mask
SHINETSU CHEMICAL CO2 citations63
US5098515AMar 24, 1992
Method for the preparation of a silicon carbide-silicon nitride composite membrane for x-ray lithography
SHINETSU CHEMICAL CO4 citations63
US5089085AFeb 18, 1992
Silicon carbide membrane for x-ray lithography and method for the prepartion thereof
SHINETSU CHEMICAL CO2 citations63
US7927763B2Apr 19, 2011
Pellicle for photolithography and pellicle frame
SHINETSU CHEMICAL CO0 citations52
US7604904B2Oct 20, 2009
Pellicle for lithography
SHINETSU CHEMICAL CO1 citations52
US7432023B2Oct 7, 2008
Method for producing a pellicle for lithography
SHINETSU CHEMICAL CO0 citations52
NAGATA YOSHIHIKO
4 patentsUS8192899B2Jun 5, 2012
Pellicle for photolithography
NAGATA YOSHIHIKO6 citations71
US8956788B2Feb 17, 2015
Pellicle for lithography and a method of making thereof
NAGATA YOSHIHIKO1 citations50
US8590281B2Nov 26, 2013
Method for hermetically closing an air-tight bag for pellicle
NAGATA YOSHIHIKO0 citations50
US8273507B2Sep 25, 2012
Pellicle for lithography and a method for making the same
NAGATA YOSHIHIKO0 citations50