Inventor

OKAYASU TETSUO

JP9 patents

⚠️ This page may combine multiple inventors who share the name “OKAYASU TETSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AZ ELECTRONIC MATERIALS USA

2 patents

US7745093B2Jun 29, 2010

Water soluble resin composition and method for pattern formation using the same

AZ ELECTRONIC MATERIALS USA14 citations81

US7799513B2Sep 21, 2010

Process for preventing development defect and composition for use in the same

AZ ELECTRONIC MATERIALS USA2 citations60

MERCK PATENT GMBH

2 patents

US11999827B2Jun 4, 2024

Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same

MERCK PATENT GMBH0 citations57

US11866554B2Jan 9, 2024

Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same

MERCK PATENT GMBH0 citations55

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L

2 patents

US9810988B2Nov 7, 2017

Composition for forming overlay film, and resist pattern formation method employing the same

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1 citations51

US9482952B2Nov 1, 2016

Composition for forming topcoat layer and resist pattern formation method employing the same

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1 citations50

OKAYASU TETSUO

1 patent

US9448485B2Sep 20, 2016

Composition for forming fine resist pattern and pattern forming method using same

OKAYASU TETSUO2 citations55

AZ ELECTRONIC MAT LUXEMBOURG SARL

1 patent

US10268117B2Apr 23, 2019

Top-layer membrane formation composition and method for forming resist pattern using same

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations50

SAMSUNG ELECTRONICS CO LTD

1 patent

US9804493B2Oct 31, 2017

Composition for forming topcoat layer and resist pattern formation method employing the same

SAMSUNG ELECTRONICS CO LTD0 citations50