Inventor
WEST BRIAN T
US29 patents
⚠️ This page may combine multiple inventors who share the name “WEST BRIAN T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
28 patentsUS9240308B2Jan 19, 2016
Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
APPLIED MATERIALS INC17 citations92
US9378928B2Jun 28, 2016
Apparatus for treating a gas in a conduit
APPLIED MATERIALS INC15 citations90
US10662520B2May 26, 2020
Method for recycling substrate process components
APPLIED MATERIALS INC10 citations84
US9779920B2Oct 3, 2017
Sputtering target with backside cooling grooves
APPLIED MATERIALS INC5 citations84
US9552967B2Jan 24, 2017
Abatement system having a plasma source
APPLIED MATERIALS INC7 citations83
US9230780B2Jan 5, 2016
Hall effect enhanced capacitively coupled plasma source
APPLIED MATERIALS INC14 citations83
US7048814B2May 23, 2006
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus
APPLIED MATERIALS INC16 citations83
US9767990B2Sep 19, 2017
Apparatus for treating a gas in a conduit
APPLIED MATERIALS INC9 citations82
US7993470B2Aug 9, 2011
Fabricating and cleaning chamber components having textured surfaces
APPLIED MATERIALS INC8 citations82
US11011356B2May 18, 2021
Sputtering target with backside cooling grooves
APPLIED MATERIALS INC3 citations73
US10714321B2Jul 14, 2020
Sputtering target with backside cooling grooves
APPLIED MATERIALS INC1 citations73
US9754771B2Sep 5, 2017
Encapsulated magnetron
APPLIED MATERIALS INC6 citations73
US7033447B2Apr 25, 2006
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus
APPLIED MATERIALS INC8 citations73
US9543124B2Jan 10, 2017
Capacitively coupled plasma source for abating compounds produced in semiconductor processes
APPLIED MATERIALS INC4 citations72
US10153143B2Dec 11, 2018
Smart chamber and smart chamber components
APPLIED MATERIALS INC3 citations71
US9779917B2Oct 3, 2017
Process chamber gas flow improvements
APPLIED MATERIALS INC3 citations71
US10781518B2Sep 22, 2020
Gas cooled electrostatic chuck (ESC) having a gas channel formed therein and coupled to a gas box on both ends of the gas channel
APPLIED MATERIALS INC3 citations70
US11251067B2Feb 15, 2022
Pedestal lift for semiconductor processing chambers
APPLIED MATERIALS INC2 citations68
US10049863B2Aug 14, 2018
Sputtering target with backside cooling grooves
APPLIED MATERIALS INC1 citations63
US10930479B2Feb 23, 2021
Smart chamber and smart chamber components
APPLIED MATERIALS INC0 citations61
US11469080B1Oct 11, 2022
Magnetron assembly having coolant guide for enhanced target cooling
APPLIED MATERIALS INC0 citations60
US11056372B2Jul 6, 2021
Low temperature biasable substrate support
APPLIED MATERIALS INC0 citations58
US10867776B2Dec 15, 2020
Physical vapor deposition in-chamber electro-magnet
APPLIED MATERIALS INC1 citations56
US11114289B2Sep 7, 2021
Non-disappearing anode for use with dielectric deposition
APPLIED MATERIALS INC0 citations52
US10176973B2Jan 8, 2019
Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
APPLIED MATERIALS INC0 citations51
US11072852B2Jul 27, 2021
Pre-conditioned chamber components
APPLIED MATERIALS INC0 citations49
US11114285B2Sep 7, 2021
Apparatus for exhaust cooling
APPLIED MATERIALS INC0 citations48
US11981989B2May 14, 2024
Automated temperature controlled substrate support
APPLIED MATERIALS INC0 citations46