Inventor

PARK YOU-JUNG

KR10 patents

⚠️ This page may combine multiple inventors who share the name “PARK YOU-JUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG SDI CO LTD

4 patents

US10066057B2Sep 4, 2018

Organic layer composition, organic layer, and method of forming patterns

SAMSUNG SDI CO LTD2 citations70

US10332751B2Jun 25, 2019

Monomer, organic layer composition, organic layer, and method of forming patterns

SAMSUNG SDI CO LTD0 citations39

US10018914B2Jul 10, 2018

Hardmask composition and method of forming patterns using the hardmask composition

SAMSUNG SDI CO LTD0 citations39

US9908990B2Mar 6, 2018

Organic layer composition, organic layer, and method of forming patterns

SAMSUNG SDI CO LTD0 citations36

CHEIL IND INC

3 patents

US9529257B2Dec 27, 2016

Hard mask composition and method for forming pattern using same

CHEIL IND INC1 citations51

US9823566B2Nov 21, 2017

Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition

CHEIL IND INC0 citations50

US9513546B2Dec 6, 2016

Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition

CHEIL IND INC1 citations49

CHOI YOO-JEONG

1 patent

US9665003B2May 30, 2017

Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

CHOI YOO-JEONG3 citations68

MOON JOON-YOUNG

1 patent

US8900997B2Dec 2, 2014

Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith

MOON JOON-YOUNG0 citations33

SONG HYUN JI

1 patent

US10345706B2Jul 9, 2019

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

SONG HYUN JI0 citations31