Inventor
BANSAL AMIT KUMAR
US59 patents
Patents
50 patentsUS9157730B2Oct 13, 2015
PECVD process
APPLIED MATERIALS INC49 citations97
US9816187B2Nov 14, 2017
PECVD process
APPLIED MATERIALS INC8 citations92
US9458537B2Oct 4, 2016
PECVD process
APPLIED MATERIALS INC12 citations92
US11492705B2Nov 8, 2022
Isolator apparatus and methods for substrate processing chambers
APPLIED MATERIALS INC8 citations84
US10793954B2Oct 6, 2020
PECVD process
APPLIED MATERIALS INC3 citations84
US10431480B2Oct 1, 2019
External substrate rotation in a semiconductor processing system
APPLIED MATERIALS INC6 citations84
US10060032B2Aug 28, 2018
PECVD process
APPLIED MATERIALS INC3 citations84
US10889894B2Jan 12, 2021
Faceplate with embedded heater
APPLIED MATERIALS INC7 citations82
US11613812B2Mar 28, 2023
PECVD process
APPLIED MATERIALS INC2 citations73
US11299805B2Apr 12, 2022
Plasma corrision resistive heater for high temperature processing
APPLIED MATERIALS INC3 citations73
US11293099B2Apr 5, 2022
Showerhead assembly with multiple fluid delivery zones
APPLIED MATERIALS INC1 citations73
US11242600B2Feb 8, 2022
High temperature face plate for deposition application
APPLIED MATERIALS INC2 citations73
US11078568B2Aug 3, 2021
Pumping apparatus and method for substrate processing chambers
APPLIED MATERIALS INC4 citations73
US10266943B2Apr 23, 2019
Plasma corrosion resistive heater for high temperature processing
APPLIED MATERIALS INC4 citations73
US10233543B2Mar 19, 2019
Showerhead assembly with multiple fluid delivery zones
APPLIED MATERIALS INC4 citations73
US10153185B2Dec 11, 2018
Substrate temperature measurement in multi-zone heater
APPLIED MATERIALS INC3 citations73
US10128118B2Nov 13, 2018
Bottom and side plasma tuning having closed loop control
APPLIED MATERIALS INC2 citations73
US9865431B2Jan 9, 2018
Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber
APPLIED MATERIALS INC5 citations73
US9711360B2Jul 18, 2017
Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system
APPLIED MATERIALS INC5 citations73
US11827980B2Nov 28, 2023
Isolator apparatus and methods for substrate processing chambers
APPLIED MATERIALS INC2 citations72
US10636628B2Apr 28, 2020
Method for cleaning a process chamber
APPLIED MATERIALS INC2 citations72
US9922819B2Mar 20, 2018
Wafer rotation in a semiconductor chamber
APPLIED MATERIALS INC2 citations72
US11742235B2Aug 29, 2023
Coaxial lift device with dynamic leveling
APPLIED MATERIALS INC3 citations71
US10879041B2Dec 29, 2020
Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers
APPLIED MATERIALS INC4 citations71
US10276353B2Apr 30, 2019
Dual-channel showerhead for formation of film stacks
APPLIED MATERIALS INC4 citations71
US9593419B2Mar 14, 2017
Wafer rotation in a semiconductor chamber
APPLIED MATERIALS INC2 citations71
US11530482B2Dec 20, 2022
Faceplate having a curved surface
APPLIED MATERIALS INC1 citations70
US10600624B2Mar 24, 2020
System and method for substrate processing chambers
APPLIED MATERIALS INC5 citations70
US11443921B2Sep 13, 2022
Radio frequency ground system and method
APPLIED MATERIALS INC2 citations68
US12581896B2Mar 17, 2026
External substrate system rotation in a semiconductor processing system
APPLIED MATERIALS INC0 citations63
US11574825B2Feb 7, 2023
External substrate system rotation in a semiconductor processing system
APPLIED MATERIALS INC0 citations63
US11908662B2Feb 20, 2024
Device and method for tuning plasma distribution using phase control
APPLIED MATERIALS INC0 citations62
US11898249B2Feb 13, 2024
PECVD process
APPLIED MATERIALS INC0 citations62
US11697877B2Jul 11, 2023
High temperature face plate for deposition application
APPLIED MATERIALS INC0 citations62
US10930475B2Feb 23, 2021
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations62
US10910227B2Feb 2, 2021
Bottom and side plasma tuning having closed loop control
APPLIED MATERIALS INC0 citations62
US10438860B2Oct 8, 2019
Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition process
APPLIED MATERIALS INC1 citations62
US10030306B2Jul 24, 2018
PECVD apparatus and process
APPLIED MATERIALS INC1 citations62
US12087555B2Sep 10, 2024
Method and system for cleaning a process chamber
APPLIED MATERIALS INC0 citations61
US11532462B2Dec 20, 2022
Method and system for cleaning a process chamber
APPLIED MATERIALS INC0 citations61
US11136665B2Oct 5, 2021
Shadow ring for modifying wafer edge and bevel deposition
APPLIED MATERIALS INC1 citations61
US12110590B2Oct 8, 2024
Faceplate having a curved surface
APPLIED MATERIALS INC0 citations60
US11851759B2Dec 26, 2023
Faceplate having a curved surface
APPLIED MATERIALS INC0 citations60
US11107704B2Aug 31, 2021
Gas input system for a substrate processing chamber
APPLIED MATERIALS INC0 citations60
US12012653B2Jun 18, 2024
Cleaning assemblies for substrate processing chambers
APPLIED MATERIALS INC1 citations59
US11434569B2Sep 6, 2022
Ground path systems for providing a shorter and symmetrical ground path
APPLIED MATERIALS INC0 citations52
US11004663B2May 11, 2021
Chamber design for semiconductor processing
APPLIED MATERIALS INC0 citations52
US10720349B2Jul 21, 2020
Temperature measurement in multi-zone heater
APPLIED MATERIALS INC0 citations52
US10669629B2Jun 2, 2020
Showerhead assembly with multiple fluid delivery zones
APPLIED MATERIALS INC0 citations52
US10544508B2Jan 28, 2020
Controlling temperature in substrate processing systems
APPLIED MATERIALS INC0 citations52
Showing the top 50 of 59 patents by PatentIndex Score.