Inventor

BALASUBRAMANIAN GANESH

US107 patents

⚠️ This page may combine multiple inventors who share the name “BALASUBRAMANIAN GANESH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BALASUBRAMANIAN GANESH

APPLIED MATERIALS INC

PECVD process

Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations

Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors

PECVD process

PECVD process

Methods of uniformity control for low flow process and chamber to chamber matching

Uniformity control for low flow process and chamber to chamber matching

Blocker plate bypass to distribute gases in a chemical vapor deposition system

PECVD process

PECVD process

Method for depositing an amorphous carbon film with improved density and step coverage

Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system

Gas flow profile modulated control of overlay in plasma CVD films

Interface engineering to improve adhesion between low k stacks

Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile

Chamber configurations and processes for particle control

PECVD process

Processing chamber and method with thermal control

Bottom and side plasma tuning having closed loop control

Plasma parameters and skew characterization by high speed imaging

Plasma processing using multiple radio frequency power feeds for improved uniformity

Gas flow profile modulated control of overlay in plasma CVD films

Wafer rotation in a semiconductor chamber

Remote capacitively coupled plasma source with improved ion blocker

Loadlock integrated bevel etcher system

Loadlock integrated bevel etcher system

Loadlock integrated bevel etcher system

Dual-channel showerhead for formation of film stacks

Edge hump reduction faceplate by plasma modulation

Wafer rotation in a semiconductor chamber

Method of using dual frequency RF power in a process chamber

Sensor metrology data integration

Chucking process and system for substrate processing chambers

System and method for substrate processing chambers

Method and system for supplying a cleaning gas into a process chamber

Apparatus and method for centering a substrate in a process chamber

Methods to improve the in-film defectivity of PECVD amorphous carbon films

Chamber configurations and processes for particle control

PECVD process

Process chamber with reduced plasma arc

Plasma processing using multiple radio frequency power feeds for improved uniformity

Dual temperature heater

Bottom and side plasma tuning having closed loop control

BANK OF AMERICA

Multi-encrypted message response manager

Server for handling multi-encrypted messages

SHAH ASHISH

Systems for plasma enhanced chemical vapor deposition and bevel edge etching

PADHI DEENESH

Methods to improve the in-film defectivity of PECVD amorphous carbon films

SANKARAKRISHNAN RAMPRAKASH

Confined process volume PECVD chamber

DU BOIS DALE R

Shadow ring for modifying wafer edge and bevel deposition

SCHLUMBERGER TECHNOLOGY CORP

Isolation valves