Inventor
DEUFEL MARKUS
DE3 patents
Patents
3 patentsUS10329668B2Jun 25, 2019
Device and method for exhaust gas treatment on CVD reactor
AIXTRON SE11 citations72
US11286566B2Mar 29, 2022
Apparatus for deposition of a III-V semiconductor layer
AIXTRON SE0 citations45
US10883171B2Jan 5, 2021
CVD reactor and method for cleaning a CVD reactor
AIXTRON SE0 citations44