Inventor
HUANG KUAN-WEI
TW31 patents
⚠️ This page may combine multiple inventors who share the name “HUANG KUAN-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
27 patentsUS9425049B2Aug 23, 2016
Cut first self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD14 citations92
US9368349B2Jun 14, 2016
Cut last self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD20 citations92
US10170307B1Jan 1, 2019
Method for patterning semiconductor device using masking layer
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
US9406511B2Aug 2, 2016
Self-aligned double patterning
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10269576B1Apr 23, 2019
Etching and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations82
US11676821B2Jun 13, 2023
Self-aligned double patterning
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US11037789B2Jun 15, 2021
Cut last self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10553431B2Feb 4, 2020
Cut last self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10256096B2Apr 9, 2019
Self-aligned double patterning
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10109486B2Oct 23, 2018
Cut first self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9698016B2Jul 4, 2017
Cut first self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11244858B2Feb 8, 2022
Etching to reduce line wiggling
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10672614B2Jun 2, 2020
Etching and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US9761451B2Sep 12, 2017
Cut last self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US12191158B2Jan 7, 2025
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12183628B2Dec 31, 2024
Integrated circuit and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12068167B2Aug 20, 2024
Self-aligned double patterning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11784056B2Oct 10, 2023
Self-aligned double patterning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11521857B2Dec 6, 2022
Cut first self-aligned litho-etch patterning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11456210B2Sep 27, 2022
Integrated circuit and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12322651B2Jun 3, 2025
Etching to reduce line wiggling
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12444646B2Oct 14, 2025
Devices with reduced capacitances
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12046506B2Jul 23, 2024
Devices with reduced capacitances
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12374583B2Jul 29, 2025
Semiconductor devices and methods of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12165914B2Dec 10, 2024
Air spacer surrounding conductive features and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12002710B2Jun 4, 2024
Semiconductor structure and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US10475700B2Nov 12, 2019
Etching to reduce line wiggling
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40