Inventor
KRIS ROMAN
IL19 patents
Patents
19 patentsUS10354376B2Jul 16, 2019
Technique for measuring overlay between layers of a multilayer structure
APPLIED MATERIALS ISRAEL LTD5 citations80
US9530199B1Dec 27, 2016
Technique for measuring overlay between layers of a multilayer structure
APPLIED MATERIALS ISRAEL LTD12 citations80
US11276160B2Mar 15, 2022
Determining a critical dimension variation of a pattern
APPLIED MATERIALS ISRAEL LTD2 citations70
US9916652B2Mar 13, 2018
Technique for measuring overlay between layers of a multilayer structure
APPLIED MATERIALS ISRAEL LTD2 citations69
US9165376B2Oct 20, 2015
System, method and computer readable medium for detecting edges of a pattern
APPLIED MATERIALS ISRAEL LTD6 citations66
US7973919B2Jul 5, 2011
High resolution wafer inspection system
APPLIED MATERIALS ISRAEL LTD3 citations61
US11756188B2Sep 12, 2023
Determining a critical dimension variation of a pattern
APPLIED MATERIALS ISRAEL LTD0 citations59
US11301983B2Apr 12, 2022
Measuring height difference in patterns on semiconductor wafers
APPLIED MATERIALS ISRAEL LTD0 citations58
US12347734B2Jul 1, 2025
Examination of a hole formed in a semiconductor specimen
APPLIED MATERIALS ISRAEL LTD0 citations53
US11476081B2Oct 18, 2022
Evaluating an intermediate product related to a three-dimensional NAND memory unit
APPLIED MATERIALS ISRAEL LTD0 citations52
US11651509B2May 16, 2023
Method, system and computer program product for 3D-NAND CDSEM metrology
APPLIED MATERIALS ISRAEL LTD0 citations51
US11056404B1Jul 6, 2021
Evaluating a hole formed in an intermediate product
APPLIED MATERIALS ISRAEL LTD1 citations51
US7714999B2May 11, 2010
High resolution wafer inspection system
APPLIED MATERIALS ISRAEL LTD0 citations51
US10748272B2Aug 18, 2020
Measuring height difference in patterns on semiconductor wafers
APPLIED MATERIALS ISRAEL LTD0 citations48
US9824852B2Nov 21, 2017
CD-SEM technique for wafers fabrication control
APPLIED MATERIALS ISRAEL LTD0 citations43
US11686571B2Jun 27, 2023
Local shape deviation in a semiconductor specimen
APPLIED MATERIALS ISRAEL LTD0 citations42
US11455715B2Sep 27, 2022
Epitaxy metrology in fin field effect transistors
APPLIED MATERIALS ISRAEL LTD0 citations42
US11443420B2Sep 13, 2022
Generating a metrology recipe usable for examination of a semiconductor specimen
APPLIED MATERIALS ISRAEL LTD0 citations41
US10731979B2Aug 4, 2020
Method for monitoring nanometric structures
APPLIED MATERIALS ISRAEL LTD0 citations40