Inventor

RATHSACK BENJAMEN M

US29 patents

⚠️ This page may combine multiple inventors who share the name “RATHSACK BENJAMEN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RATHSACK BENJAMEN M

TOKYO ELECTRON LTD

Integration of absorption based heating bake methods into a photolithography track system

Multi-step bake apparatus and method for directed self-assembly lithography control

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

Enhanced process yield using a hot-spot library

Use of grapho-epitaxial directed self-assembly to precisely cut lines

Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists

Controlling cleaning of a layer on a substrate using nozzles

Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes

Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)

Multi-step bake apparatus and method for directed self-assembly lithography control

Facilitation of spin-coat planarization over feature topography during substrate fabrication

Photo-sensitized chemically amplified resist (PS-CAR) simulation

Substrate backside texturing

Line pattern collapse mitigation through gap-fill material application

Substrate backside texturing

Topography minimization of neutral layer overcoats in directed self-assembly applications

Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists

Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition

Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes

Subtractive methods for creating dielectric isolation structures within open features

RATHSACK BENJAMEN M

Simplified micro-bridging and roughness analysis

Method of forming patterns using block copolymers and articles thereof

Electrostatic post exposure bake apparatus and method

SOMERVELL MARK H

Line pattern collapse mitigation through gap-fill material application

Use of blended solvents in defectivity prevention

Use of blended solvents in defectivity prevention