P

Inventor

MURAMATSU MAKOTO

JP51 patents
⚠️ This page may combine multiple inventors who share the name “MURAMATSU MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

22 patents
US6248168B1Jun 19, 2001

Spin coating apparatus including aging unit and solvent replacement unit

TOKYO ELECTRON LTD63 citations95
US6589339B2Jul 8, 2003

Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film

TOKYO ELECTRON LTD26 citations92
US9418860B2Aug 16, 2016

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

TOKYO ELECTRON LTD12 citations91
US6726775B2Apr 27, 2004

Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film

TOKYO ELECTRON LTD6 citations73
US10622267B2Apr 14, 2020

Facilitation of spin-coat planarization over feature topography during substrate fabrication

TOKYO ELECTRON LTD2 citations72
US11315784B2Apr 26, 2022

Method for forming insulating film, apparatus for processing substrate, and system for processing substrate

TOKYO ELECTRON LTD2 citations71
US10418242B2Sep 17, 2019

Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers

TOKYO ELECTRON LTD2 citations71
US12374551B2Jul 29, 2025

Substrate treatment method and substrate treatment system

TOKYO ELECTRON LTD0 citations62
US11693319B2Jul 4, 2023

Substrate processing method, substrate processing apparatus, and storage medium

TOKYO ELECTRON LTD1 citations62
US11823897B2Nov 21, 2023

Method for forming insulating film, apparatus for processing substrate, and system for processing substrate

TOKYO ELECTRON LTD0 citations61
US11574812B2Feb 7, 2023

Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers

TOKYO ELECTRON LTD0 citations61
US7326299B2Feb 5, 2008

Process liquid supply nozzle, process liquid supply device and nozzle cleaning method

TOKYO ELECTRON LTD4 citations59
US11631581B2Apr 18, 2023

Insulating film forming method, insulating film forming device, and substrate processing system

TOKYO ELECTRON LTD0 citations51
US10121659B2Nov 6, 2018

Pattern forming method and heating apparatus

TOKYO ELECTRON LTD0 citations51
US9859118B2Jan 2, 2018

Pattern forming method and heating apparatus

TOKYO ELECTRON LTD0 citations51
US9618849B2Apr 11, 2017

Pattern forming method, pattern forming apparatus, and computer readable storage medium

TOKYO ELECTRON LTD1 citations51
US7205024B2Apr 17, 2007

Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film

TOKYO ELECTRON LTD0 citations51
US9810987B2Nov 7, 2017

Substrate treatment method, computer storage medium and substrate treatment system

TOKYO ELECTRON LTD0 citations41
US9741583B2Aug 22, 2017

Substrate treatment method, computer readable storage medium and substrate treatment system

TOKYO ELECTRON LTD0 citations41
US9530645B2Dec 27, 2016

Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium

TOKYO ELECTRON LTD0 citations41
US10586711B2Mar 10, 2020

Substrate processing method and computer storage medium

TOKYO ELECTRON LTD0 citations40
US10329144B2Jun 25, 2019

Substrate treatment method, computer storage medium and substrate treatment system

TOKYO ELECTRON LTD0 citations40

NTN TOYO BEARING CO LTD

7 patents

MURAMATSU MAKOTO

5 patents

FUJIFILM CORP

4 patents

MASUDA YUI

3 patents

TAISHO PHARMACEUTICAL CO LTD

2 patents

YAMASAKI TATSUYA

2 patents

YOU GEN

1 patent

FUJI XEROX CO LTD

1 patent

EGUCHI MASAAKI

1 patent

YASUI MAKOTO

1 patent

MITSUOKA KAZUYUKI

1 patent

Showing the top 50 of 51 patents by PatentIndex Score.