Inventor
MUEHL REINHOLD
DE6 patents
Patents
6 patentsUS5055383AOct 8, 1991
Process for making masks with structures in the submicron range
IBM24 citations91
US4816115AMar 28, 1989
Process of making via holes in a double-layer insulation
IBM41 citations87
US4980317ADec 25, 1990
Method of producing integrated semiconductor structures comprising field-effect transistors with channel lengths in the submicron range using a three-layer resist system
IBM20 citations79
US4461237AJul 24, 1984
Plasma reactor for etching and coating substrates
IBM20 citations78
US4513203AApr 23, 1985
Mask and system for mutually aligning objects in ray exposure systems
IBM19 citations72
US4489146ADec 18, 1984
Reverse process for making chromium masks using silicon dioxide dry etch mask
IBM13 citations71