Inventor
PECKERAR MARTIN C
US22 patents
⚠️ This page may combine multiple inventors who share the name “PECKERAR MARTIN C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
US NAVY
9 patentsUS6348240B1Feb 19, 2002
Methods for and products of modification and metallization of oxidizable surfaces, including diamond surfaces, by plasma oxidation
US NAVY69 citations95
US6017658AJan 25, 2000
Lithographic mask and method for fabrication thereof
US NAVY72 citations94
US4184078AJan 15, 1980
Pulsed X-ray lithography
US NAVY44 citations90
US4818661AApr 4, 1989
Method for fabricating thin film metallic meshes for use as Fabry-Perot interferometer elements, filters and other devices
US NAVY25 citations85
US5825040AOct 20, 1998
Bright beam method for super-resolution in e-beam lithography
US NAVY17 citations84
US6392242B1May 21, 2002
Fiducial beam position monitor
US NAVY7 citations73
US5113367AMay 12, 1992
Cross entropy deconvolver circuit adaptable to changing convolution functions
US NAVY18 citations73
US4849925AJul 18, 1989
Maximum entropy deconvolver circuit based on neural net principles
US NAVY7 citations73
US7470989B2Dec 30, 2008
Technique for perfecting the active regions of wide bandgap semiconductor nitride devices
US NAVY1 citations48
US ARMY
5 patentsUS5342737AAug 30, 1994
High aspect ratio metal microstructures and method for preparing the same
US ARMY110 citations96
US5814414ASep 29, 1998
High aspect ratio metal microstructures and method for preparing the same
US ARMY12 citations72
US5703373ADec 30, 1997
Alignment fiducial for improving patterning placement accuracy in e-beam masks for x-ray lithography
US ARMY11 citations72
US5336892AAug 9, 1994
Method and system for electron beam lithography
US ARMY18 citations71
US5575888ANov 19, 1996
Sidewall passivation by oxidation during refractory-metal plasma etching
US ARMY7 citations67
UNIV MARYLAND
3 patentsUS8052908B2Nov 8, 2011
Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography
UNIV MARYLAND8 citations81
US8054450B2Nov 8, 2011
Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays
UNIV MARYLAND6 citations70
US12499789B2Dec 16, 2025
Nanophotonics phased-array system for virtual and augmented reality multifocal displays
UNIV MARYLAND0 citations59