Inventor
MIURA TAKAO
JP32 patents
⚠️ This page may combine multiple inventors who share the name “MIURA TAKAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JAPAN SYNTHETIC RUBBER CO LTD
16 patentsUS5580695ADec 3, 1996
Chemically amplified resist
JAPAN SYNTHETIC RUBBER CO LTD58 citations96
US5525457AJun 11, 1996
Reflection preventing film and process for forming resist pattern using the same
JAPAN SYNTHETIC RUBBER CO LTD69 citations96
US5110706AMay 5, 1992
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive
JAPAN SYNTHETIC RUBBER CO LTD83 citations96
US5494777AFeb 27, 1996
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD27 citations92
US5410005AApr 25, 1995
Reflection preventing film and process for forming resist pattern using the same
JAPAN SYNTHETIC RUBBER CO LTD32 citations92
US5376498ADec 27, 1994
Negative type radiation-sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD22 citations92
US5332650AJul 26, 1994
Radiation-sensitive composition
JAPAN SYNTHETIC RUBBER CO LTD20 citations92
US5238775AAug 24, 1993
Radiation-sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD30 citations91
US5019479AMay 28, 1991
Positive type radiation-sensitive resin composition comprising a photosensitizer and a novolak resin
JAPAN SYNTHETIC RUBBER CO LTD40 citations91
US5478691ADec 26, 1995
Radiation-sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD19 citations80
US5609988AMar 11, 1997
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD7 citations73
US5482816AJan 9, 1996
Radiation-sensitive composition
JAPAN SYNTHETIC RUBBER CO LTD14 citations73
US5413896AMay 9, 1995
I-ray sensitive positive resist composition
JAPAN SYNTHETIC RUBBER CO LTD16 citations73
US3948667AApr 6, 1976
Photosensitive compositions
JAPAN SYNTHETIC RUBBER CO LTD14 citations71
US4132666AJan 2, 1979
Process for preparing alkali metal dispersions
JAPAN SYNTHETIC RUBBER CO LTD16 citations65
US5753406AMay 19, 1998
Radiation-sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD5 citations61
FUJITSU LTD
8 patentsUS5250836AOct 5, 1993
Semiconductor device having silicon-on-insulator structure
FUJITSU LTD26 citations92
US5233218AAug 3, 1993
Semiconductor wafer and process for producing same
FUJITSU LTD49 citations92
US5231045AJul 27, 1993
Method of producing semiconductor-on-insulator structure by besol process with charged insulating layers
FUJITSU LTD50 citations92
US5148247ASep 15, 1992
Semiconductor device having trench isolation
FUJITSU LTD41 citations92
US4755479AJul 5, 1988
Manufacturing method of insulated gate field effect transistor using reflowable sidewall spacers
FUJITSU LTD32 citations92
US5705425AJan 6, 1998
Process for manufacturing semiconductor devices separated by an air-bridge
FUJITSU LTD50 citations90
US5066993ANov 19, 1991
Semiconductor device having semiconductor-on-insulator structure
FUJITSU LTD19 citations74
US5017998AMay 21, 1991
Semiconductor device using SOI substrate
FUJITSU LTD11 citations73