Inventor
IRIE SHINJI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “IRIE SHINJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOPPAN PRINTING CO LTD
8 patentsUS11249070B2Feb 15, 2022
Anti-cancer drug assessment method
TOPPAN PRINTING CO LTD2 citations71
US11254917B2Feb 22, 2022
Method of promoting spheroid formation
TOPPAN PRINTING CO LTD1 citations61
US12326433B2Jun 10, 2025
Abnormal cardiac rhythm myocardial model and method for producing same, agent for forming abnormal cardiac rhythm myocardial model, and method for evaluating drug efficacy of heart disease therapeutic
TOPPAN PRINTING CO LTD0 citations60
US11221326B2Jan 11, 2022
Method of preparing cells exhibiting drug resistance, method of screening anticancer drugs, and anticancer drug screening kit
TOPPAN PRINTING CO LTD0 citations60
US11179495B2Nov 23, 2021
Three-dimensional tissue body, method for producing same, and formation agent for three-dimensional tissue body
TOPPAN PRINTING CO LTD1 citations60
US12523647B2Jan 13, 2026
Method for evaluating anticancer effect and method for predicting effectiveness of cancer immunotherapy
TOPPAN PRINTING CO LTD0 citations56
US10627327B2Apr 21, 2020
Membrane vesicle recovery device, membrane vesicle recovery method, and membrane vesicle analysis method
TOPPAN PRINTING CO LTD0 citations51
US11492652B2Nov 8, 2022
Method and kit for assessing possibility of cancerization
TOPPAN PRINTING CO LTD0 citations50
TOKYO ELECTRON LTD
6 patentsUS6966771B2Nov 22, 2005
Boat for heat treatment and vertical heat treatment equipment
TOKYO ELECTRON LTD15 citations83
US12500091B2Dec 16, 2025
Etching method, method of removing etching residue, and storage medium
TOKYO ELECTRON LTD0 citations62
US11322350B2May 3, 2022
Non-plasma etch of titanium-containing material layers with tunable selectivity to alternate metals and dielectrics
TOKYO ELECTRON LTD0 citations62
US12593634B2Mar 31, 2026
Selective gas phase etch of silicon germanium alloys
TOKYO ELECTRON LTD0 citations58
US11189498B2Nov 30, 2021
Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film
TOKYO ELECTRON LTD1 citations55
US10665470B2May 26, 2020
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations49