Inventor
TOLMACHEV YURI NIKOLAEVICH
KR7 patents
Patents
7 patentsUS7252716B2Aug 7, 2007
Gas injection apparatus for semiconductor processing system
SAMSUNG ELECTRONICS CO LTD234 citations97
US7210424B2May 1, 2007
High-density plasma processing apparatus
SAMSUNG ELECTRONICS CO LTD21 citations91
US7381292B2Jun 3, 2008
Inductively coupled plasma generating apparatus incorporating serpentine coil antenna
SAMSUNG ELECTRONICS CO LTD12 citations83
US7404879B2Jul 29, 2008
Ionized physical vapor deposition apparatus using helical self-resonant coil
SAMSUNG ELECTRONICS CO LTD11 citations82
US6835919B2Dec 28, 2004
Inductively coupled plasma system
SAMSUNG ELECTRONICS CO LTD12 citations69
US7740738B2Jun 22, 2010
Inductively coupled antenna and plasma processing apparatus using the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US7052583B2May 30, 2006
Magnetron cathode and magnetron sputtering apparatus comprising the same
SAMSUNG ELECTRONICS CO LTD3 citations61