Inventor
NEGRI DARIA
IL31 patents
⚠️ This page may combine multiple inventors who share the name “NEGRI DARIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA CORP
17 patentsUS11573497B2Feb 7, 2023
System and method for measuring misregistration of semiconductor device wafers utilizing induced topography
KLA CORP5 citations85
US12253805B2Mar 18, 2025
Scatterometry overlay metrology with orthogonal fine-pitch segmentation
KLA CORP2 citations75
US12032300B2Jul 9, 2024
Imaging overlay with mutually coherent oblique illumination
KLA CORP2 citations72
US11796925B2Oct 24, 2023
Scanning overlay metrology using overlay targets having multiple spatial frequencies
KLA CORP6 citations72
US11281112B2Mar 22, 2022
Method of measuring misregistration in the manufacture of topographic semiconductor device wafers
KLA CORP2 citations72
US12001148B2Jun 4, 2024
Enhancing performance of overlay metrology
KLA CORP2 citations70
US12585200B2Mar 24, 2026
Imaging overlay with mutually coherent oblique illumination
KLA CORP0 citations62
US11880141B2Jan 23, 2024
Method of measuring misregistration in the manufacture of topographic semiconductor device wafers
KLA CORP0 citations62
US12327741B2Jun 10, 2025
Oscillating secondary stage for frame-mode overlay metrology
KLA CORP0 citations59
US11592755B2Feb 28, 2023
Enhancing performance of overlay metrology
KLA CORP1 citations59
US12080610B2Sep 3, 2024
Wavelet system and method for ameliorating misregistration and asymmetry of semiconductor devices
KLA CORP0 citations58
US12170215B2Dec 17, 2024
Systems and methods for correction of impact of wafer tilt on misregistration measurements
KLA CORP0 citations52
US12105431B2Oct 1, 2024
Annular apodizer for small target overlay measurement
KLA CORP0 citations52
US12165930B2Dec 10, 2024
Adaptive modeling misregistration measurement system and method
KLA CORP0 citations51
US12222199B2Feb 11, 2025
Systems and methods for measurement of misregistration and amelioration thereof
KLA CORP0 citations50
US12105414B2Oct 1, 2024
Targets for diffraction-based overlay error metrology
KLA CORP0 citations50
US12131959B2Oct 29, 2024
Systems and methods for improved metrology for semiconductor device wafers
KLA CORP0 citations48
KLA TENCOR CORP
10 patentsUS9080971B2Jul 14, 2015
Metrology systems and methods
KLA TENCOR CORP21 citations92
US8873054B2Oct 28, 2014
Metrology systems and methods
KLA TENCOR CORP14 citations92
US10190979B2Jan 29, 2019
Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
KLA TENCOR CORP12 citations83
US9581430B2Feb 28, 2017
Phase characterization of targets
KLA TENCOR CORP15 citations82
US10444161B2Oct 15, 2019
Systems and methods for metrology with layer-specific illumination spectra
KLA TENCOR CORP2 citations73
US10579768B2Mar 3, 2020
Process compatibility improvement by fill factor modulation
KLA TENCOR CORP3 citations72
US11852590B1Dec 26, 2023
Systems and methods for metrology with layer-specific illumination spectra
KLA TENCOR CORP1 citations62
US9341769B2May 17, 2016
Spectral control system
KLA TENCOR CORP2 citations62
US9921050B2Mar 20, 2018
Spectral control system
KLA TENCOR CORP0 citations51
US10976562B2Apr 13, 2021
Nano-structured non-polarizing beamsplitter
KLA TENCOR CORP0 citations50