Inventor
MIEHER WALTER D
US24 patents
⚠️ This page may combine multiple inventors who share the name “MIEHER WALTER D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
18 patentsUS7317531B2Jan 8, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP83 citations98
US7242477B2Jul 10, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP124 citations98
US7352453B2Apr 1, 2008
Method for process optimization and control by comparison between 2 or more measured scatterometry signals
KLA TENCOR TECH CORP56 citations97
US7879627B2Feb 1, 2011
Overlay marks and methods of manufacturing such marks
KLA TENCOR TECH CORP25 citations96
US7433040B2Oct 7, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP28 citations96
US7385699B2Jun 10, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP34 citations96
US7301634B2Nov 27, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP35 citations96
US7298481B2Nov 20, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP46 citations96
US7289213B2Oct 30, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP49 citations96
US7280212B2Oct 9, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP45 citations96
US7933016B2Apr 26, 2011
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP15 citations92
US7876440B2Jan 25, 2011
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP13 citations92
US7663753B2Feb 16, 2010
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP19 citations92
US7564557B2Jul 21, 2009
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP19 citations92
US7379183B2May 27, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP18 citations92
US7656512B2Feb 2, 2010
Method for determining lithographic focus and exposure
KLA TENCOR TECH CORP15 citations84
US7616313B2Nov 10, 2009
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP17 citations84
US7867693B1Jan 11, 2011
Methods for forming device structures on a wafer
KLA TENCOR TECH CORP5 citations63
KLA TENCOR CORP
6 patentsUS9885962B2Feb 6, 2018
Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
KLA TENCOR CORP35 citations94
US9347879B2May 24, 2016
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR CORP17 citations93
US10451412B2Oct 22, 2019
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR CORP7 citations84
US9702693B2Jul 11, 2017
Apparatus for measuring overlay errors
KLA TENCOR CORP6 citations84
US9030661B1May 12, 2015
Alignment measurement system
KLA TENCOR CORP16 citations80
US9081287B2Jul 14, 2015
Methods of measuring overlay errors in area-imaging e-beam lithography
KLA TENCOR CORP1 citations50