P

Inventor

WONG Keith Tatseun

US23 patents
⚠️ This page may combine multiple inventors who share the name “WONG Keith Tatseun”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

20 patents
US10622214B2Apr 14, 2020

Tungsten defluorination by high pressure treatment

APPLIED MATERIALS INC15 citations94
US10847360B2Nov 24, 2020

High pressure treatment of silicon nitride film

APPLIED MATERIALS INC15 citations86
US10636704B2Apr 28, 2020

Seam-healing method upon supra-atmospheric process in diffusion promoting ambient

APPLIED MATERIALS INC14 citations86
US10269571B2Apr 23, 2019

Methods for fabricating nanowire for semiconductor applications

APPLIED MATERIALS INC19 citations86
US10790183B2Sep 29, 2020

Selective oxidation for 3D device isolation

APPLIED MATERIALS INC14 citations85
US10049927B2Aug 14, 2018

Seam-healing method upon supra-atmospheric process in diffusion promoting ambient

APPLIED MATERIALS INC14 citations84
US12198951B2Jan 14, 2025

High pressure wafer processing systems and related methods

APPLIED MATERIALS INC1 citations74
US10916426B2Feb 9, 2021

Formation of crystalline, layered transition metal dichalcogenides

APPLIED MATERIALS INC2 citations73
US10192752B2Jan 29, 2019

Self-assembled monolayer blocking with intermittent air-water exposure

APPLIED MATERIALS INC3 citations72
US11542597B2Jan 3, 2023

Selective deposition of metal oxide by pulsed chemical vapor deposition

APPLIED MATERIALS INC2 citations70
US12593627B2Mar 31, 2026

Tungsten defluorination by high pressure treatment

APPLIED MATERIALS INC0 citations62
US11756828B2Sep 12, 2023

Cluster processing system for forming a transition metal material

APPLIED MATERIALS INC0 citations62
US11705337B2Jul 18, 2023

Tungsten defluorination by high pressure treatment

APPLIED MATERIALS INC0 citations62
US10957590B2Mar 23, 2021

Method for forming a layer

APPLIED MATERIALS INC0 citations62
US10818510B2Oct 27, 2020

Self-assembled monolayer blocking with intermittent air-water exposure

APPLIED MATERIALS INC1 citations62
US11993845B2May 28, 2024

High selectivity atomic layer deposition process

APPLIED MATERIALS INC1 citations59
US11993842B2May 28, 2024

Selective deposition of metal oxide by pulsed chemical vapor deposition

APPLIED MATERIALS INC0 citations59
US11664215B2May 30, 2023

High selectivity atomic later deposition process

APPLIED MATERIALS INC0 citations48
US12142467B2Nov 12, 2024

Self-assembled monolayer deposition from low vapor pressure organic molecules

APPLIED MATERIALS INC0 citations47
US10062561B2Aug 28, 2018

High-pressure annealing and reducing wet etch rates

APPLIED MATERIALS INC0 citations45

MICROMATERIALS LLC

3 patents